Acetic Acid

Acetic Acid

SCHEMBL6260411

CC(=O)O.ClCCCCC(Cl)C[Co]

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
NOS3 known ✓ P29474 2/20 0.30
NOS1 known ✓ P29475 2/20 0.30
NOS2 known ✓ P35228 2/20 0.30
CNR1 P21554 1/20 0.33
CNR2 P34972 1/20 0.33
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6551938 0.85
Acetic Acid SCHEMBL452674 0.82 CNR1 (0.33) CNR1CNR2NOS3NOS1NOS2
SCHEMBL7615127 0.72 GPR84 (0.36) TSHR
SCHEMBL28789890 0.72 CNR1 (0.40) CNR1CNR2TSHR
SCHEMBL7928645 0.71 FOLH1 (0.41) CYP1A2CYP3A4TSHR
SCHEMBL8370840 0.71 CNR1 (0.35) CNR1CNR2
Bicarbonate SCHEMBL4532520 0.68 CNR1 (0.33) CNR1CNR2
SCHEMBL29105368 0.67 TSHR (0.40) CNR1CNR2TSHR
SCHEMBL11693016 0.67 TBXAS1 (0.43) NOS3NOS1NOS2CYP1A2CYP3A4
SCHEMBL7920483 0.67 SLC22A6 (0.38) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0862589-B1 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS SUMITOMO BAKELITE CO (JP) 2004-02-18 EP claimed
US-20020128408-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-12 US claimed
EP-0828768-B1 HOMOPOLYMERS AND COPOLYMERS OF CATIONICALLY POLYMERIZABLE MONOMERS AND METHOD OF THEIR PREPARATION GOODRICH CO B F (US) 2001-04-18 EP claimed
CN-1269810-A Photoresist compositions comprising polycyclic polymers with acid labile pendant groups GOODRICH CO B F (US) 2000-10-11 CN claimed
EP-1021477-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP claimed
US-6031058-A POLYMERS OF THE INVENTION INCLUDE POLYCYCLIC REPEAT UNITS THAT CONTAIN PENDANT SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 2000-02-29 US claimed
WO-1999014256-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO claimed
EP-0729480-B1 ADDITION POLYMERS DERIVED FROM NORBORNENE-FUNCTIONAL MONOMERS AND PROCESS THEREFOR GOODRICH CO B F (US) 1999-01-27 EP claimed
EP-0862589-A2 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 1998-09-09 EP claimed
CN-1185164-A Homopolymers and copolymers of cationically polymerizable monomers, and prepn. method therefor GOODRICH CO B F (US) 1998-06-17 CN claimed
US-5741869-A REACTION MIXTURE FOR FORMING ADDITION POLYMER COMPRISING NORBORNENE-FUNCTIONAL MONOMER, SOLVENT, GROUP 8 METAL-CONTAINING CATALYST SYSTEM, CHAIN TRANSFER AGENT THE B.F. GOODRICH COMPANY (US) 1998-04-21 US claimed
EP-0828768-A1 HOMOPOLYMERS AND COPOLYMERS OF CATIONICALLY POLYMERIZABLE MONOMERS AND METHOD OF THEIR PREPARATION The B.F. Goodrich Company (US) 1998-03-18 EP claimed
WO-1997020871-A2 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 1997-06-12 WO claimed
EP-0758657-A2 Addition polymers derived from norbornene-functional monomers and process therefor The B.F. Goodrich Company (US) 1997-02-19 EP claimed
WO-1996037529-A1 HOMOPOLYMERS AND COPOLYMERS OF CATIONICALLY POLYMERIZABLE MONOMERS AND METHOD OF THEIR PREPARATION THE B.F. GOODRICH COMPANY (US) 1996-11-28 WO claimed
US-5571881-A Addition polymers derived from norbornene-functional monomers and process therefor THE B. F. GOODRICH COMPANY (US) 1996-11-05 US claimed
EP-0729480-A1 ADDITION POLYMERS DERIVED FROM NORBORNENE-FUNCTIONAL MONOMERS AND PROCESS THEREFOR The B.F. Goodrich Company (US) 1996-09-04 EP claimed
WO-1995014048-A9 ADDITION POLYMERS DERIVED FROM NORBORNENE-FUNCTIONAL MONOMERS AND PROCESS THEREFOR 1995-07-27 WO claimed
WO-1995014048-A1 ADDITION POLYMERS DERIVED FROM NORBORNENE-FUNCTIONAL MONOMERS AND PROCESS THEREFOR THE B.F. GOODRICH COMPANY (US) 1995-05-26 WO claimed
EP-0885405-B1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS SUMITOMO BAKELITE CO (JP) 2005-06-08 EP disclosed
CN-1198181-C Photoresist compositions comprising polycyclic polymers with acid labile pendant groups SUMITOMO BAKELITE CO (JP) 2005-04-20 CN disclosed
US-6790579-B1 PHOTOACID INITIATOR GENERATES ACID EFFECTING POLARITY CHANGE RENDERING POLYMER WATER SOLUBLE IN AREAS EXPOSED TO IMAGING SOURCE; INTEGRATED CIRCUITS, SEMICONDUCTORS SUMITOMO BAKELITE CO., LTD. (JP) 2004-09-14 US disclosed
US-6723486-B2 POLYMERIZING AT LEAST TWO TYPES OF POLYCYCLIC (NORBORNENE) MONOMERS ONE OF WHICH CONTAINING A PENDANT ACID LABILE GROUP AND ANOTHER OF WHICH CONTAINING A PENDNT POLAR FUNCTIONAL GROUP USING A GROUP 8 TRANSITION METAL CATALYST SUMITOMO BAKELITE CO., LTD. (JP) 2004-04-20 US disclosed
EP-0862589-B1 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS SUMITOMO BAKELITE CO (JP) 2004-02-18 EP disclosed
EP-1157058-B1 METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS SUMITOMO BAKELITE CO (JP) 2003-06-25 EP disclosed
US-20020136982-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups THE B.F. GOODRICH COMPANY 2002-09-26 US disclosed
US-20020128408-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-12 US disclosed
US-6426396-B2 PARAPHENYLENE POLYMER PRODUCED BY REMOVING THE SUBSTITIUENTS FROM THE CYCLOHEXADIENE RING; NICKEL BASED CATALYST; ELECTROCONDUCTIVITY KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO (JP) 2002-07-30 US disclosed
US-6420503-B1 POLYCARBONS/OTHER/ SUMITOMO BAKELITE CO. LTD. (JP) 2002-07-16 US disclosed
US-20020007026-A1 POLY (CYCLIC CONJUGATED DIENE) AND PROCESS FOR PRODUCING THE SAME NAKANO MITSURU (JP) 2002-01-17 US disclosed
EP-1157058-A1 METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS The B.F. Goodrich Company (US) 2001-11-28 EP disclosed
US-6235849-B1 INCLUDE COPOLYMERS WITH ONE OR MORE COMONOMERS SUCH AS NORBORNENE, ETHYLENE, AN ACRYLATE OR SULFUR DIOXIDE OR CARBON MONOXIDE; ALSO RING-OPENING METATHESIS POLYMERIZATION; GROUP VIII METAL COMPOUND CATALYST THE B. F. GOODRICH COMPANY 2001-05-22 US disclosed
US-6232417-B1 USING COORDINATION CATALYST THE B. F. GOODRICH COMPANY 2001-05-15 US disclosed
EP-0828768-B1 HOMOPOLYMERS AND COPOLYMERS OF CATIONICALLY POLYMERIZABLE MONOMERS AND METHOD OF THEIR PREPARATION GOODRICH CO B F (US) 2001-04-18 EP disclosed
US-6136499-A RADIATION SENSITIVE PHOTORESIST COMPOSITION COMPRISING A PHOTOACID INITIATOR AND A POLYCYCLIC POLYMER COMPRISING REPEATING UNITS THAT CONTAIN PENDANT ACID LABILE GROUPS THE B. F. GOODRICH COMPANY (US) 2000-10-24 US disclosed
CN-1269810-A Photoresist compositions comprising polycyclic polymers with acid labile pendant groups GOODRICH CO B F (US) 2000-10-11 CN disclosed
WO-2000046268-A1 NORBORNENE SULFONAMIDE POLYMERS THE B.F. GOODRICH COMPANY (US) 2000-08-10 WO disclosed
WO-2000046267-A1 METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS THE B.F. GOODRICH COMPANY (US) 2000-08-10 WO disclosed
EP-1021477-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
EP-1021750-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
US-6031058-A POLYMERS OF THE INVENTION INCLUDE POLYCYCLIC REPEAT UNITS THAT CONTAIN PENDANT SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 2000-02-29 US disclosed
US-5912313-A MOLDINGS, COATINGS, ADHESIVES, MEMBRANES; OXIDATION, HEAT AND CHEMICAL RESISTANCE; DIELECTRICS, INTEGRATED CIRCUITS THE B. F. GOODRICH COMPANY (US) 1999-06-15 US disclosed
WO-1999014635-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed
WO-1999014256-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed
EP-0758657-B1 Addition polymers derived from norbornene-functional monomers GOODRICH CO B F (US) 1999-02-03 EP disclosed
EP-0729480-B1 ADDITION POLYMERS DERIVED FROM NORBORNENE-FUNCTIONAL MONOMERS AND PROCESS THEREFOR GOODRICH CO B F (US) 1999-01-27 EP disclosed
EP-0885405-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1998-12-23 EP disclosed
EP-0862589-A2 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 1998-09-09 EP disclosed
US-5741869-A REACTION MIXTURE FOR FORMING ADDITION POLYMER COMPRISING NORBORNENE-FUNCTIONAL MONOMER, SOLVENT, GROUP 8 METAL-CONTAINING CATALYST SYSTEM, CHAIN TRANSFER AGENT THE B.F. GOODRICH COMPANY (US) 1998-04-21 US disclosed
US-5677405-A COPOLYMER OF NORBORNENE-TYPE MONOMER WHICH UNDERGOES ADDITION POLYMERIZATION AND CATIONICALLY POLYMERIZABLE MONOMER THE B.F. GOODRICH COMPANY (US) 1997-10-14 US disclosed
WO-1997033198-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1997-09-12 WO disclosed
WO-1997020871-A2 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 1997-06-12 WO disclosed
EP-0758657-A2 Addition polymers derived from norbornene-functional monomers and process therefor The B.F. Goodrich Company (US) 1997-02-19 EP disclosed
US-5571881-A Addition polymers derived from norbornene-functional monomers and process therefor THE B. F. GOODRICH COMPANY (US) 1996-11-05 US disclosed
US-5569730-A HAVING TERMINAL END GROUP DERIVED FROM CHAIN TRANSFER AGENT CONTAINING TERMINAL OLEFINIC DOUBLE BOND THE B. F. GOODRICH COMPANY (US) 1996-10-29 US disclosed
US-5569730-A HAVING TERMINAL END GROUP DERIVED FROM CHAIN TRANSFER AGENT CONTAINING TERMINAL OLEFINIC DOUBLE BOND THE B. F. GOODRICH COMPANY (US) 1996-10-29 US disclosed