SCHEMBL6262453

SCHEMBL6262453

O=C(O)c1cc(C(=O)O)c(-c2ccccc2)c(-c2ccccc2)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HNF4A P41235 2/20 0.50
▸ PTPN1 P18031 2/20 0.47
▸ AKR1C3 P42330 1/20 0.45
▸ AKR1C2 P52895 1/20 0.45
▸ AKR1C1 Q04828 1/20 0.45
▸ KDM4E B2RXH2 1/20 0.44
▸ KMO O15229 1/20 0.44
▸ FOLH1 Q04609 1/20 0.44
▸ PTPN2 P17706 1/20 0.44
▸ PTPN6 P29350 1/20 0.44
▸ DHODH Q02127 1/20 0.43
▸ TTR P02766 3/20 0.42
▸ FABP3 P05413 1/20 0.42
▸ FABP4 P15090 1/20 0.42
▸ FABP5 Q01469 1/20 0.42
▸ ALDH1A1 P00352 1/20 0.42
▸ CDC25B P30305 2/20 0.42
▸ DHFR P00374 1/20 0.42
▸ MCL1 Q07820 1/20 0.42
▸ ACMSD Q8TDX5 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16271133 0.93 DHODH (0.49) HNF4APTPN1KDM4EKMOFOLH1
SCHEMBL29082654 0.88 KMO (0.50) HNF4APTPN1KDM4EKMODHODH
SCHEMBL16271134 0.86 TTR (0.49) HNF4APTPN1KDM4EKMOFOLH1
SCHEMBL16271127 0.85 TTR (0.47) HNF4APTPN1KDM4EKMOFOLH1
SCHEMBL10479912 0.81 PTPN1 (0.71) HNF4APTPN1AKR1C3AKR1C2AKR1C1
SCHEMBL9423207 0.81 PTPN1 (0.47) HNF4APTPN1AKR1C3AKR1C2AKR1C1
SCHEMBL30763496 0.81 PTPN1 (0.71) HNF4APTPN1AKR1C3AKR1C2AKR1C1
SCHEMBL28410944 0.81 HNF4A (0.53) HNF4APTPN1AKR1C3AKR1C2AKR1C1
SCHEMBL30883369 0.80 PTPN1 (0.46) HNF4APTPN1AKR1C3AKR1C2AKR1C1
SCHEMBL29446578 0.80 PTPN1 (0.46) HNF4APTPN1AKR1C3AKR1C2AKR1C1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3334794-A1 USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT COMPRISING SUBSTRATES BASF SE (DE) 2018-06-20 — — EP disclosed
WO-2017025536-A1 USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT COMPRISING SUBSTRATES BASF SE (DE) 2017-02-16 — — WO disclosed
EP-1556330-A2 PHENYL COMPOUNDS GLAXO GROUP LIMITED (GB) 2005-07-27 — — EP disclosed
WO-2004039753-A2 PHENYL COMPOUNDS GLAXO GROUP LIMITED (GB) 2004-05-13 — — WO disclosed
Send feedback