SCHEMBL6284996

SCHEMBL6284996

OC1(C23CCC(CC2)C3)CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12808870 0.77 LMNA (0.33)
SCHEMBL9146797 0.75 HSD11B1 (0.33)
SCHEMBL31579237 0.70
SCHEMBL4819959 0.69
SCHEMBL4814394 0.68
SCHEMBL17674904 0.65
SCHEMBL15484283 0.65
SCHEMBL151704 0.65
SCHEMBL1539174 0.64 ALDH1A1 (0.37)
SCHEMBL4612532 0.64 ALDH1A1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6849381-B2 Copolymers and photoresist compositions comprising same SHIPLEY COMPANY, L.L.C. (US) 2005-02-01 US disclosed
US-6777157-B1 SHORT WAVELENGTH RELIEF IMAGING; INCLUDES TETRAPOLYMER COMPOSED OF ALICYCLIC FUNCTIOALIZED PHOTOACID LABILE MOIETY WITH CARBOXYLATED ETHYLENE AND TWO NORBORENYL MONOMERS SHIPLEY COMPANY, L.L.C. 2004-08-17 US disclosed
US-20030215742-A1 Novel copolymers and photoresist compositions comprising same BARCLAY GEORGE G (US) 2003-11-20 US disclosed
EP-1128213-A2 Photoresist compositions comprising novel copolymers Shipley Company LLC (US) 2001-08-29 EP disclosed