SCHEMBL6287430

SCHEMBL6287430

CCOC(CCOCC1CO1)(OCC)[SiH2]C

nearest known ligand 0.47

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.47
ALDH1A1 P00352 4/20 0.45
TDP1 Q9NUW8 1/20 0.45
TSHR P16473 2/20 0.44
MAPK1 P28482 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27996470 0.77 SMN1; SMN2 (0.50) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL25882446 0.73 SMN1; SMN2 (0.59) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL1780768 0.73 TSHR (0.56) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL6064313 0.72 SMN1; SMN2 (0.45) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL2890239 0.71 TSHR (0.48) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL4298953 0.71 TSHR (0.58) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL1792687 0.71 SMN1; SMN2 (0.61) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL465572 0.71 SMN1; SMN2 (0.56) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL28426872 0.71 SMN1; SMN2 (0.44) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL471904 0.70 SMN1; SMN2 (0.65) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120153318-A Photosensitive resin composition, method for producing cured relief pattern using same, and method for producing polyimide film 旭化成株式会社 2025-06-13 CN disclosed
CN-120129875-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2025-06-10 CN disclosed
EP-3878551-B1 METHOD FOR PRODUCING ORGANIC SULFUR COMPOUND, CARRIER, METHOD FOR PRODUCING SAID CARRIER, LIGAND-IMMOBILIZING CARRIER, CHROMATOGRAPHY COLUMN, AND METHOD FOR DETECTING OR ISOLATING TARGET SUBSTANCE JSR CORP (JP) 2025-05-21 EP disclosed
CN-120021354-A Method for manufacturing circuit board 味之素株式会社 2025-05-20 CN disclosed
US-12227604-B2 Method for producing organic sulfur compound, carrier, method for producing said carrier, ligand-immobilizing carrier, chromatography column, and method for detecting or isolating target substance JSR CORPORATION (JP) 2025-02-18 US disclosed
CN-118946956-A Composition for forming polymer film and method for forming selective polymer film 日产化学株式会社 2024-11-12 CN disclosed
CN-118946610-A Hybrid bond insulating film forming material, method for manufacturing semiconductor device, and semiconductor device 艾曲迪微系统股份有限公司 2024-11-12 CN disclosed
CN-118838117-A Polyimide cured film 旭化成株式会社 2024-10-25 CN disclosed
WO-2024216630-A1 PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION 深圳先进电子材料国际创新研究院 2024-10-24 WO disclosed
WO-2024198017-A1 NEGATIVE PHOTOSENSITIVE POLYIMIDE PRECURSOR RESIN COMPOSITION 深圳先进电子材料国际创新研究院 2024-10-03 WO disclosed
US-20160349639-A1 IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD FUJI XEROX CO., LTD. (JP) 2016-12-01 US disclosed
US-20140100349-A1 Silicic Acid (Hetero) Polycondensates Comprising Organically Polymerisable Groups and Either Sulphonate Groups or Sulphate Groups, Organic Polymerisates Produced therefrom, and a Method for Producing said Polycondensates Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 2014-04-10 US disclosed
US-6861195-B2 Image forming method KONICA CORPORATION (JP) 2005-03-01 US disclosed
US-6797444-B2 A PROTECTIVE LAYER CONTAINING A COUPLING FLUOROPOLYMER PARTICLES DISPERSED IN A COPOLYMER HAVING A FLUORINE ATOM-CONTAINING SILOXANE ADDITION-CONDENSATION PRODUCT IN A SIDE CHAIN; NONABRASIVE, HARDENING KONICA CORPORATION (JP) 2004-09-28 US disclosed
US-20040141771-A1 Image forming method OSHIBA TAKEO (JP) 2004-07-22 US disclosed
US-6692882-B2 CYLINDER SUBSTRATE OVERCOATED WITH PHOTOSENSITIVE COMPOUND; IMAGEWISE EXPOSURE; DEVELOPMENT LATENT IMAGES KONICA CORPORATION (JP) 2004-02-17 US disclosed
US-20030134209-A1 Electrophotographic photoreceptor and production method of the same KONICA CORPORATION (JP) 2003-07-17 US disclosed
US-6569586-B2 Comprises photosensitive layer and resin layer including organic polymer, siloxane component, and charge transfer component; durability KONICA CORPORATION (JP) 2003-05-27 US disclosed
US-20020110748-A1 Cylinder substrate overcoated with photosensitive compound; imagewise exposure; development latent images KONICA CORPORATION (JP) 2002-08-15 US disclosed
US-20020076631-A1 Photoreceptor for forming electrostatic latent image KONICA CORPORATION (JP) 2002-06-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12227604-B2 Method for producing organic sulfur compound, carrier, method for producing said carrier, ligand-immobilizing carrier, chromatography column, and method for detecting or isolating target substance TACR1, TST, TACR2 SMN1; SMN2 4073/4885ALDH1A1 3037/4885TDP1 4768/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.