SCHEMBL6294173

SCHEMBL6294173

CC=C(C)C(=O)O.OC1CCCCC1O

nearest known ligand 0.37

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.37
CA2 P00918 2/20 0.37
CA4 P22748 2/20 0.37
ALDH1A1 P00352 2/20 0.35
PTGS1 P23219 1/20 0.30
AKR1C3 P42330 1/20 0.30
GABRA1 P14867 1/20 0.30
TSHR P16473 1/20 0.30
GABRG2 P18507 1/20 0.30
RXRA P19793 1/20 0.30
GABRB3 P28472 1/20 0.30
RXRB P28702 1/20 0.30
GABRB2 P47870 1/20 0.30
RXRG P48443 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28043823 0.84 ALDH1A1 (0.38) ALDH1A1PTGS1AKR1C3GABRA1TSHR
SCHEMBL7067167 0.81 EPHX2 (0.36) ALDH1A1PTGS1AKR1C3GABRA1TSHR
SCHEMBL16554798 0.81 EPHX2 (0.36) ALDH1A1PTGS1AKR1C3GABRA1TSHR
Acetic Acid SCHEMBL9785964 0.80 CA1 (0.48) CA1CA2CA4TSHR
SCHEMBL28626882 0.80 PTGS1 (0.37) PTGS1AKR1C3
SCHEMBL28202230 0.80 PTGS1 (0.37) PTGS1AKR1C3
Cyclohexane SCHEMBL220149 0.80 PTGS1 (0.37) PTGS1AKR1C3
SCHEMBL940622 0.80 PTGS1 (0.37) PTGS1AKR1C3
SCHEMBL20586201 0.80 PTGS1 (0.37) PTGS1AKR1C3
SCHEMBL28380140 0.78 PTGS1 (0.33) ALDH1A1PTGS1AKR1C3GABRA1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6916598-B2 Ionization radiation imageable photopolymer compositions E. I. DU PONT DE NEMOURS AND COMPANY (US) 2005-07-12 US disclosed
US-20030180665-A1 Ionization radiation imageable photopolymer compositions WANG YING (US) 2003-09-25 US disclosed
US-6569602-B1 Radiation curable mixtures comprising monomers, curing agents, sensitizers, binders and/or fillers used for lithography, stereolithography, photoresists and ceramics E. I. DU PONT DE NEMOURS AND COMPANY 2003-05-27 US disclosed
CN-1322309-A Ionization radiation imageable photopolymer compositions DU PONT (US) 2001-11-14 CN disclosed
WO-2000020926-A9 IONIZATION RADIATION IMAGEABLE PHOTOPOLYMER COMPOSITIONS DU PONT (US) 2000-09-14 WO disclosed