SCHEMBL7067167

SCHEMBL7067167

CC=C(C)C(=O)O.OC1CCC(O)CC1

nearest known ligand 0.36

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.36
ALDH1A1 P00352 2/20 0.33
PTGS1 P23219 1/20 0.32
AKR1C3 P42330 1/20 0.32
TSHR P16473 2/20 0.32
GABRA1 P14867 1/20 0.32
GABRG2 P18507 1/20 0.32
RXRA P19793 1/20 0.32
GABRB3 P28472 1/20 0.32
RXRB P28702 1/20 0.32
GABRB2 P47870 1/20 0.32
RXRG P48443 1/20 0.32
SHBG P04278 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16554798 1.00 EPHX2 (0.36) EPHX2ALDH1A1PTGS1AKR1C3TSHR
Methacrylic Acid SCHEMBL9000897 0.84 ALDH1A1 (0.33) ALDH1A1
SCHEMBL28380140 0.82 PTGS1 (0.33) ALDH1A1PTGS1AKR1C3TSHRGABRA1
SCHEMBL6294173 0.81 CA1 (0.37) ALDH1A1PTGS1AKR1C3TSHRGABRA1
SCHEMBL1396002 0.81 FFAR3 (0.43) ALDH1A1PTGS1AKR1C3TSHR
SCHEMBL871351 0.81 FFAR3 (0.43) ALDH1A1PTGS1AKR1C3TSHR
SCHEMBL338643 0.81 FFAR3 (0.43) ALDH1A1PTGS1AKR1C3TSHR
SCHEMBL133954 0.81
SCHEMBL18814 0.81
SCHEMBL15042 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103200926-B Acrylate copolymer thickener 路博润高级材料公司 2016-11-09 CN claimed
CN-105722494-A Impact modified denture base compositions 登士柏国际公司 2016-06-29 CN claimed
US-20030180665-A1 Ionization radiation imageable photopolymer compositions WANG YING (US) 2003-09-25 US claimed
US-6569602-B1 Radiation curable mixtures comprising monomers, curing agents, sensitizers, binders and/or fillers used for lithography, stereolithography, photoresists and ceramics E. I. DU PONT DE NEMOURS AND COMPANY 2003-05-27 US claimed
CN-1322309-A Ionization radiation imageable photopolymer compositions DU PONT (US) 2001-11-14 CN claimed
EP-1121623-A1 IONIZATION RADIATION IMAGEABLE PHOTOPOLYMER COMPOSITIONS E.I. DU PONT DE NEMOURS AND COMPANY (US) 2001-08-08 EP claimed
WO-2000020926-A9 IONIZATION RADIATION IMAGEABLE PHOTOPOLYMER COMPOSITIONS DU PONT (US) 2000-09-14 WO claimed
WO-2000020926-A1 IONIZATION RADIATION IMAGEABLE PHOTOPOLYMER COMPOSITIONS E.I. DU PONT DE NEMOURS AND COMPANY (US) 2000-04-13 WO claimed
CN-108350203-A Black resin composition, polyimide with black resin cured film, method for producing same, and flexible printed wiring board using black resin cured film 株式会社钟化 2018-07-31 CN disclosed
CN-103200926-B Acrylate copolymer thickener 路博润高级材料公司 2016-11-09 CN disclosed
CN-105722494-A Impact modified denture base compositions 登士柏国际公司 2016-06-29 CN disclosed
CN-104853693-A Three-dimensional fabricating material systems for producing dental products DENTSPLY INT INC 2015-08-19 CN disclosed
CN-102854748-B Photosensitive composition and application thereof ZHEJIANG RONGTAI TECHNOLOGY ENTPR CO LTD 2014-05-21 CN disclosed
CN-103200926-A Acrylate copolymer thickeners LUBRIZOL ADVANCED MAT INC 2013-07-10 CN disclosed
CN-1660597-A Ink jet printable thick film ink compositions and processes DU PONT (US) 2005-08-31 CN disclosed
CN-1639639-A Aqueous developable photoimageable thick film compositions containing photospeed accelerators DU PONT (US) 2005-07-13 CN disclosed
CN-1175460-C Plasma display panel device and method for manufacturing the same ��Ļ���Ű˾ 2004-11-10 CN disclosed
CN-1495877-A FOrmation of air-gap ϣ 2004-05-12 CN disclosed
CN-1322309-A Ionization radiation imageable photopolymer compositions DU PONT (US) 2001-11-14 CN disclosed
CN-1197281-A Plasma display panel device and method for producing the same DU PONT (US) 1998-10-28 CN disclosed