SCHEMBL6308258

SCHEMBL6308258

Cc1ccc(S(=O)(=O)Oc2ccccc2)c(-c2ccccc2)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.44
PTGDR2 Q9Y5Y4 1/20 0.42
HDAC7 Q8WUI4 1/20 0.41
PTGS2 P35354 2/20 0.41
ALDH1A1 P00352 3/20 0.40
MAPT P10636 3/20 0.40
KDM4E B2RXH2 2/20 0.40
F2 P00734 2/20 0.40
MAOB P27338 1/20 0.40
ELANE P08246 1/20 0.40
PPARG P37231 2/20 0.38
HTT P42858 2/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
CA2 P00918 3/20 0.38
CA9 Q16790 3/20 0.38
CA1 P00915 2/20 0.38
XBP1 P17861 1/20 0.38
KMT2A Q03164 1/20 0.38
CA12 O43570 1/20 0.37
MCOLN3 Q8TDD5 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28907458 0.81 CA2 (0.47) LMNAALDH1A1MAPTCA2CA9
SCHEMBL27956621 0.80 CA2 (0.45) LMNAPTGS2ALDH1A1MAPTKDM4E
SCHEMBL4126510 0.80 HDAC7 (0.47) LMNAPTGDR2HDAC7PTGS2ALDH1A1
SCHEMBL28134701 0.79 LMNA (0.45) LMNAPTGS2ALDH1A1MAPTKDM4E
SCHEMBL7234855 0.78 HDAC7 (0.46) LMNAPTGDR2HDAC7PTGS2ALDH1A1
SCHEMBL10995940 0.78 LMNA (0.44) LMNAPTGS2ALDH1A1MAPTKDM4E
SCHEMBL28726730 0.78 PTGDR2 (0.40) LMNAPTGDR2HDAC7ALDH1A1MAPT
SCHEMBL10724782 0.78 PTGDR2 (0.46) LMNAPTGDR2HDAC7ALDH1A1MAPT
SCHEMBL29047698 0.77 LMNA (0.43) LMNAPTGS2ALDH1A1MAPTKDM4E
SCHEMBL11572510 0.77 TDP1 (0.57) PTGDR2ALDH1A1MAPTPPARGCA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030165770-A1 Photoresist composition and method of forming pattern using the same SAMSUNG ELECTRONICS, CO., LTD. 2003-09-04 US claimed
US-6893791-B2 Photoresist composition and method of forming pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-05-17 US disclosed
US-20030165770-A1 Photoresist composition and method of forming pattern using the same SAMSUNG ELECTRONICS, CO., LTD. 2003-09-04 US disclosed