SCHEMBL631547

SCHEMBL631547

C=C(CC1(CC)COC1)C(=O)OC

nearest known ligand 0.36

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.36
ALDH1A1 P00352 1/20 0.33
POLB P06746 1/20 0.30
HSD17B10 Q99714 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21224218 0.87 ALDH1A1 (0.31) TSHRALDH1A1
SCHEMBL27813406 0.82 TSHR (0.34) TSHRALDH1A1POLB
SCHEMBL782180 0.80 EPHX1 (0.31) TSHR
SCHEMBL4631285 0.79 EPHX1 (0.39) ALDH1A1
SCHEMBL28031397 0.77 TSHR (0.43) TSHRALDH1A1POLBHSD17B10MEN1
SCHEMBL30775580 0.74 ALDH1A1 (0.46) TSHRALDH1A1POLBHSD17B10MEN1
SCHEMBL22829581 0.74
SCHEMBL10030765 0.74 TSHR (0.46) TSHRPOLBHSD17B10MEN1KMT2A
SCHEMBL9895608 0.73 EPHX1 (0.31) TSHR
SCHEMBL10456331 0.72 ALDH1A1 (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 256 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114149530-B Alkali-soluble polymer for preparing LDI dry film and preparation method thereof 保定乐凯新材料股份有限公司 2023-07-21 CN claimed
CN-116179096-A Identification adhesive tape and preparation method thereof 东莞澳中新材料科技股份有限公司 2023-05-30 CN claimed
CN-115746186-A Acrylic prepolymer containing oxetane functional groups, preparation and application thereof 湖北固润科技股份有限公司 2023-03-07 CN claimed
CN-113130113-A Conductive material composition and conductive material prepared from same 财团法人工业技术研究院 2021-07-16 CN claimed
CN-108864937-B Hard coating resin composition, hard coating sheet and display device 韩国生产技术研究院 2020-09-22 CN claimed
CN-107450269-B High-toughness light-sensitive epoxy acrylic resin composition capable of being developed by weak alkaline water and preparation method thereof 浙江福斯特新材料研究院有限公司 2020-09-15 CN claimed
CN-110872469-A Thermosetting composition, cured film and color filter 捷恩智株式会社 2020-03-10 CN claimed
EP-3252110-B1 ULTRAVIOLET CURABLE RESIN COMPOSITION AND SLIDING MEMBER MINEBEA MITSUMI INC (JP) 2019-04-24 EP claimed
US-10167439-B2 Ultraviolet curable resin composition and sliding member MINEBEA MITSUMI INC. (JP) 2019-01-01 US claimed
US-20170349851-A1 ULTRAVIOLET CURABLE RESIN COMPOSITION AND SLIDING MEMBER MINEBEA MITSUMI INC. (JP) 2017-12-07 US claimed
EP-3252110-A1 ULTRAVIOLET CURABLE RESIN COMPOSITION AND SLIDING MEMBER Minebea Mitsumi Inc. (JP) 2017-12-06 EP claimed
US-20160053131-A1 COATING COMPOSITIONS FOR FORMING TONER COATINGS ISP INVESTMENTS INC. (US) 2016-02-25 US claimed
US-20160046825-A1 HYDROPHOBIC COATING COMPOSITIONS FOR FORMING TONER RECEPTIVE COATINGS ISP INVESTMENTS INC. (US) 2016-02-18 US claimed
WO-2014160631-A1 COATING COMPOSITIONS FOR FORMING TONER COATINGS ISP INVESTMENTS INC. (US) 2014-10-02 WO claimed
WO-2014160754-A1 HYDROPHOBIC COATING COMPOSITIONS FOR FORMING TONER RECEPTIVE COATINGS ISP INVESTMENTS INC. (US) 2014-10-02 WO claimed
WO-2014160696-A1 HYDROPHOBIC COATING COMPOSITIONS FOR FORMING TONER RECEPTIVE COATINGS ISP INVESTMENTS INC. (US) 2014-10-02 WO claimed
CN-118355539-A Nonaqueous electrolyte and lithium ion secondary battery 第一工业制药株式会社 2024-07-16 CN disclosed
CN-118339509-A Liquid crystal aligning agent and liquid crystal display element 日产化学株式会社 2024-07-12 CN disclosed
CN-101107565-A Pattern forming material, pattern forming apparatus and permanent pattern forming method FUJI PHOTO FILM CO LTD (JP) 2008-01-16 CN disclosed
CN-1977221-A Pattern forming method, color filter manufacturing method, color filter, and liquid crystal display FUJI PHOTO FILM CO LTD (JP) 2007-06-06 CN disclosed