SCHEMBL63180

SCHEMBL63180

Cc1ccc(O)cc1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11128456 1.00 TSHR (0.56)
SCHEMBL29375701 1.00
Formaldehyde SCHEMBL28674459 0.92 TSHR (0.50)
Bicarbonate SCHEMBL11614662 0.90 CA12 (0.52)
Orcinol SCHEMBL6279994 0.88 ALDH1A1 (0.52)
SCHEMBL15511832 0.86 KDM4E (0.56)
SCHEMBL8972378 0.86 TRPA1 (0.54)
SCHEMBL15512293 0.86 CA1 (0.61)
Pyrogallol SCHEMBL3181079 0.86 TRPA1 (0.54)
SCHEMBL10097918 0.84 ESR2 (0.53)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4367 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115981100-B Hydrofluoric acid-resistant protective material for lithography and lithography process thereof 湖南梵鑫新材料股份有限公司 2026-05-12 CN claimed
WO-2026041386-A1 ANHYDROUS COMPOSITION COMPRISING MONOESTERS AND MAINLY PETROLATUM UNILEVER IP HOLDINGS B.V. (NL) 2026-02-26 WO claimed
EP-3675806-B1 PERSONAL CARE COMPOSITION UNILEVER GLOBAL IP LTD (GB) 2026-01-21 EP claimed
EP-4637692-A1 COLOR STABILIZATION OF FORMULAE WITH AN INDOLE Unilever IP Holdings B.V. (NL) 2025-10-29 EP claimed
US-20250237947-A1 Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD (CN) 2025-07-24 US claimed
WO-2025132281-A1 COSMETIC COMPOSITION UNILEVER IP HOLDINGS B.V. (NL) 2025-06-26 WO claimed
CN-116285829-B Combined supermolecule adhesive resistant to ultralow temperature and organic solvent 陕西师范大学 2025-04-25 CN claimed
CN-119395945-A Photosensitive resin composition, photosensitive element, method for producing wiring board, and photosensitive element roll 株式会社力森诺科 2025-02-07 CN claimed
CN-119148465-A Photosensitive resin composition, photosensitive dry film and application thereof 杭州福斯特电子材料有限公司 2024-12-17 CN claimed
CN-113557474-B Photosensitive resin composition, photosensitive element, method for producing wiring board, and photosensitive element roll 株式会社力森诺科 2024-12-13 CN claimed
EP-0220080-A1 Compositions based on phthalonitrile-terminated polyaryloxy pyridine oligomers, their preparation, their use in the preparation of polyaryloxy pyridine cophthalocyanine lattices and lattices obtained CENTRE D'ETUDE DES MATERIAUX ORGANIQUES POUR TECHNOLOGIES AVANCEES (FR) 1987-04-29 EP claimed
EP-0081907-B1 SEALING MEANS FOR OSTOMY APPLIANCES E.R. Squibb &amp; Sons, Inc. (US) 1986-05-28 EP claimed
EP-0063898-B1 PROCESS FOR MAKING A BREATHABLE TAPE E.R. Squibb &amp; Sons, Inc. (US) 1986-03-05 EP claimed
US-4425404-A MULTILAYER, PROTECTIVE COATINGS MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1984-01-10 US claimed
US-4234733-A PHENOL, ALIPHATIC ESTER OR ETHER, CARBON MONOXIDE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1980-11-18 US claimed
US-4129413-A Oxidation hair dyes based upon tetraaminopyrimidine developers and mono- and dialkyl -m- dihydroxy benzene couplers HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) 1978-12-12 US claimed
US-4118586-A Process for preparing dihydroxytoluene OLIN CORPORATION (US) 1978-10-03 US claimed
US-4086281-A ACID CATALYST KOPPERS COMPANY, INC. (US) 1978-04-25 US claimed
US-4071484-A POLYETHERURETHANE COPOLYMER KOHKOKU CHEMICAL INDUSTRY CO., LTD. (JA) 1978-01-31 US claimed
US-3933925-A Hydrolysis of toluene diamines to produce methyl resorcinols KOPPERS COMPANY, INC. (US) 1976-01-20 US claimed