SCHEMBL15512293

SCHEMBL15512293

Cc1cc(-c2cc(C)c(O)c(C)c2)cc(C)c1O.Cc1ccc(O)cc1O

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.61
CA2 P00918 1/20 0.61
TSHR P16473 3/20 0.45
CASP1 P29466 1/20 0.45
CYP1A2 P05177 3/20 0.42
CYP2C9 P11712 3/20 0.42
CYP2C19 P33261 3/20 0.42
ACHE P22303 2/20 0.42
TRPA1 O75762 1/20 0.42
PTGS1 P23219 1/20 0.42
CACNA1C Q13936 1/20 0.42
HSD17B1 P14061 3/20 0.41
HSD17B2 P37059 2/20 0.41
CLK1 P49759 1/20 0.41
DYRK1A Q13627 1/20 0.41
DYRK1B Q9Y463 1/20 0.41
ESR2 Q92731 1/20 0.39
CYP3A4 P08684 3/20 0.39
MAPT P10636 2/20 0.39
HSD17B10 Q99714 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11128456 0.86 TSHR (0.56) TSHRCASP1CYP1A2CYP2C9CYP2C19
SCHEMBL63180 0.86
SCHEMBL29375701 0.86
SCHEMBL278777 0.83 CA1 (0.54) CA1CA2CYP1A2CYP2C9CYP2C19
Ethane SCHEMBL27498775 0.81 CA1 (0.52) CA1CA2HSD17B1HSD17B2ESR2
SCHEMBL278774 0.79 CA1 (0.70) CA1CA2CYP1A2CYP2C9CYP2C19
SCHEMBL503537 0.79 CA1 (0.70) CA1CA2CYP1A2CYP2C9CYP2C19
SCHEMBL17220670 0.79 CA1 (0.70) CA1CA2CYP1A2CYP2C9CYP2C19
Formaldehyde SCHEMBL28674459 0.79 TSHR (0.50) CA1CA2TSHRCASP1CYP1A2
Pyrogallol SCHEMBL3181079 0.78 TRPA1 (0.54) CA1CA2TSHRCASP1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9791773-B2 Photosensitive resin composition, color filter and liquid crystal display device CHI MEI CORPORATION (TW) 2017-10-17 US disclosed
US-9188859-B2 Positive photosensitive resin composition and method for forming patterns by using the same CHI MEI CORPORATION (TW) 2015-11-17 US disclosed
US-20140175347-A1 Photosensitive Resin Composition, Color Filter And Liquid Crystal Display Device CHI MEI CORPORATION (TW) 2014-06-26 US disclosed
US-20140065526-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERNS BY USING THE SAME CHI MEI CORPORATION (TW) 2014-03-06 US disclosed