SCHEMBL6320734

SCHEMBL6320734

NCCc1ccccc1C(F)(c1ccccc1CCN)C(F)(F)C(F)(F)F

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 12/20 0.48
MAOB P27338 2/20 0.41
HTR2A P28223 4/20 0.40
IDO1 P14902 2/20 0.38
HRH1 P35367 1/20 0.37
HTR2C P28335 2/20 0.37
CYP2A6 P11509 2/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
LOXL2 Q9Y4K0 1/20 0.34
MPO P05164 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
NFKB1 P19838 1/20 0.33
HTR1D P28221 1/20 0.33
HTR1B P28222 1/20 0.33
HTR7 P34969 1/20 0.33
CTSK P43235 1/20 0.33
HTR6 P50406 1/20 0.33
CYP2A13 Q16696 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6319928 0.85 IDO1 (0.40) TAAR1MAOBIDO1HTR2CLOXL2
SCHEMBL29915506 0.80 MAOB (0.57) TAAR1MAOBHTR2AIDO1HTR2C
SCHEMBL1011004 0.80 MAOB (0.57) TAAR1MAOBHTR2AIDO1HTR2C
Iodide SCHEMBL28682742 0.79 MAOB (0.55) TAAR1MAOBHTR2AIDO1HTR2C
Hydrochloric Acid SCHEMBL6944674 0.79 MAOB (0.59) TAAR1MAOBHTR2AIDO1HTR2C
SCHEMBL11620742 0.73 TAAR1 (0.47) TAAR1MAOBHTR2AIDO1HRH1
SCHEMBL3055366 0.72 TAAR1 (0.54) TAAR1MAOBHTR2AHRH1HTR2C
SCHEMBL7569592 0.71 TAAR1 (0.69) TAAR1MAOBHTR2AIDO1HTR2C
Acetic Acid SCHEMBL10562647 0.70 POLQ (0.50) TAAR1MAOBIDO1
SCHEMBL1964819 0.70 SMN1; SMN2 (0.39) IDO1SMN1; SMN2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1296540-B1 DISPLAY TORAY INDUSTRIES (JP) 2019-10-16 EP disclosed
US-6887643-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-05-03 US disclosed
EP-0878740-B1 Radiation sensitive polymer composition TORAY INDUSTRIES (JP) 2004-11-10 EP disclosed
US-20040053156-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-03-18 US disclosed
US-6696112-B2 POSITIVE-TYPE, PHOTOSENSITIVITY; FLAT PANEL DISPLAYS TORAY INDUSTRIES, INC. (JP) 2004-02-24 US disclosed
EP-1388758-A1 Photosensitive heat resistant resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-02-11 EP disclosed
EP-1296540-A1 DISPLAY TORAY INDUSTRIES, INC. (JP) 2003-03-26 EP disclosed
US-20020162998-A1 Display TORAY INDUSTRIES, INC. (JP) 2002-11-07 US disclosed
US-6090525-A PHOTOSENSITIVE POLYIMIDE COATING AGENT COMPOSITION WITH BOTH GOOD VISCOSITY STABILITY AT ROOM TEMPERATURE WITH LAPSE OF TIME AND GOOD PHOTOSENSITIVE PERFORMANCE TORAY INDUSTRIES, INC. (JP) 2000-07-18 US disclosed
EP-0878740-A1 Radiation sensitive polymer composition TORAY INDUSTRIES, INC. (JP) 1998-11-18 EP disclosed