SCHEMBL632178

SCHEMBL632178

CC(OC(=O)c1ccccc1)(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 2/20 0.51
TDP1 Q9NUW8 4/20 0.49
TSHR P16473 3/20 0.49
ALDH1A1 P00352 1/20 0.49
HSD17B10 Q99714 1/20 0.49
MAPT P10636 2/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
CYP2C19 P33261 2/20 0.46
CYP2D6 P10635 2/20 0.46
CYP1A2 P05177 1/20 0.46
LMNA P02545 2/20 0.45
F2 P00734 1/20 0.45
SRC P12931 1/20 0.43
HIF1A Q16665 2/20 0.43
TNF P01375 1/20 0.42
KLF5 Q13887 1/20 0.42
NOD1 Q9Y239 1/20 0.42
MAPK1 P28482 1/20 0.42
KMT2A Q03164 1/20 0.40
TP53 P04637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8462212 0.87 TDP1 (0.50) CES1TDP1TSHRALDH1A1HSD17B10
SCHEMBL1999101 0.83 CES1 (0.56) CES1TDP1TSHRALDH1A1HSD17B10
SCHEMBL11746305 0.81 CES1 (0.55) CES1TDP1TSHRALDH1A1HSD17B10
SCHEMBL1487886 0.81 CES1 (0.65) CES1TDP1TSHRALDH1A1HSD17B10
SCHEMBL2842170 0.80 CES1 (0.53) CES1TDP1TSHRALDH1A1HSD17B10
SCHEMBL1395205 0.80 CES1 (0.53) CES1TDP1TSHRALDH1A1HSD17B10
SCHEMBL5140431 0.80 CES1 (0.53) CES1TDP1TSHRALDH1A1HSD17B10
Water SCHEMBL8542684 0.80 CES1 (0.62) CES1TDP1TSHRALDH1A1HSD17B10
SCHEMBL16576962 0.79 TDP1 (0.53) CES1TDP1TSHRALDH1A1HSD17B10
SCHEMBL28537124 0.79 CYP2D6 (0.48) TDP1TSHRALDH1A1HSD17B10MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220177742-A1 REPEELABLE ADHESIVE INCLUDING PHOTOCURABLE ADHESIVE AND HEAT FOAMING AGENT AND REPEELABLE ADHESIVE TAPE INCLUDING THE SAME Truss Co., Ltd (KR) 2022-06-09 US claimed
US-12534652-B2 Repeelable adhesive including photocurable adhesive and heat foaming agent and repeelable adhesive tape including the same Truss Co., Ltd (KR) 2026-01-27 US disclosed
US-20250112101-A1 CURABLE RESIN FILM, COMPOSITE SHEET, SEMICONDUCTOR CHIP, AND SEMICONDUCTOR CHIP MANUFACTURING METHOD LINTEC CORPORATION (JP) 2025-04-03 US disclosed
US-12070931-B2 Sheet, heating element, and heating device LINTEC CORPORATION (JP) 2024-08-27 US disclosed
US-11781033-B2 Method of forming first protective film LINTEC CORPORATION (JP) 2023-10-10 US disclosed
US-20230249434-A1 SHEET, HEATING ELEMENT, AND HEATING DEVICE LINTEC OF AMERICA, INC. 2023-08-10 US disclosed
US-11723181-B2 Electromagnetic wave absorption film, electromagnetic wave absorption sheet LINTEC CORPORATION (JP) 2023-08-08 US disclosed
US-11654651-B2 Sheet, heating element, and heating device LINTEC CORPORATION (JP) 2023-05-23 US disclosed
US-11594458-B2 Curable resin film and first protective film forming sheet LINTEC CORPORATION (JP) 2023-02-28 US disclosed
CN-115427470-A Novolac resin, epoxy resin, photosensitive resin composition, curable resin composition, cured product, electronic device, method for producing novolak resin, and method for producing epoxy resin 中央硝子株式会社 2022-12-02 CN disclosed
US-5830620-A MUTILAYER; SUBSTRATE, PHOTOSENSITIVE RESIN, SLIP LAYER AND COVERINGS NIPPON PAINT CO., LTD. (JP) 1998-11-03 US disclosed
EP-0552799-B1 Photosensitive resin composition for flexographic printing plate NIPPON PAINT CO LTD (JP) 1998-05-20 EP disclosed
EP-0513493-B1 Photosensitive resin composition NIPPON PAINT CO LTD (JP) 1997-12-17 EP disclosed
US-5622813-A WATER DEVELOPMENT; STORAGE STABILITY NIPPON PAINT CO., LTD. (JP) 1997-04-22 US disclosed
US-5344744-A For flexographic printing plate, water developable, elasticity wear resistance NIPPON PAINT CO., LTD. (JP) 1994-09-06 US disclosed
EP-0346542-B1 Photocurable resin composition and method of producing decorative material using the same SHOWA HIGHPOLYMER (JP) 1994-03-16 EP disclosed
EP-0552799-A1 Photosensitive resin composition for flexographic printing plate Nippon Paint Co., Ltd. (JP) 1993-07-28 EP disclosed
EP-0513493-A1 Photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1992-11-19 EP disclosed
US-5021465-A Spiroacetal(meth)acrylate, white pigment, photoinitiator, radical-generating component SHOWA HIGHPOLYMER CO., LTD. (JP) 1991-06-04 US disclosed
EP-0346542-A1 Photocurable resin composition and method of producing decorative material using the same SHOWA HIGHPOLYMER CO., LTD. (JP) 1989-12-20 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12534652-B2 Repeelable adhesive including photocurable adhesive and heat foaming agent and repeelable adhesive tape including the same ESD, ICAM1, FGB CES1 2380/4885TDP1 300/4885TSHR 3456/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.