Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27659774 | 0.89 | HSD17B10 (0.32) | — | |
| SCHEMBL782244 | 0.74 | MAPK1 (0.36) | — | |
| SCHEMBL31511889 | 0.72 | ALDH1A1 (0.44) | ALOX15 | |
| SCHEMBL27691751 | 0.70 | THRB (0.36) | — | |
| SCHEMBL7642240 | 0.70 | — | — | |
| SCHEMBL23040978 | 0.69 | THRB (0.35) | — | |
| SCHEMBL28214671 | 0.69 | THRB (0.35) | — | |
| SCHEMBL28331144 | 0.67 | CYP1A2 (0.36) | — | |
| SCHEMBL1286179 | 0.67 | LMNA (0.35) | — | |
| SCHEMBL2997521 | 0.67 | TSHR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117908329-A | KrF positive photoresist and preparation method thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| CN-114163564-B | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2023-02-28 | — | — | CN | claimed |
| CN-114163564-A | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-03-11 | — | — | CN | claimed |
| CN-113999340-A | Film-forming resin containing silicon or sulfur and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-02-01 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| CN-114163564-B | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2023-02-28 | — | — | CN | disclosed |
| CN-114163564-A | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-03-11 | — | — | CN | disclosed |
| CN-113999340-A | Film-forming resin containing silicon or sulfur and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-02-01 | — | — | CN | disclosed |
| CN-113717314-A | Photosensitive film-forming resin, photoresist composition and preparation method thereof | 江苏集萃光敏电子材料研究所有限公司 | 2021-11-30 | — | — | CN | disclosed |
| CN-111123649-A | Negative photoresist composition containing high-heat-resistance carboxyl phenolic resin | 苏州瑞红电子化学品有限公司 | 2020-05-08 | — | — | CN | disclosed |
| CN-101146840-B | Perfluoropolyether urethane additives having (meth)acryl groups and hardcoats | 3M INNOVATIVE PROPERTIES CO | 2011-06-15 | — | — | CN | disclosed |
| CN-101146840-A | Perfluoropolyether urethane additives having (meth)acryl groups and hardcoats | 3M INNOVATIVE PROPERTIES CO (US) | 2008-03-19 | — | — | CN | disclosed |
| US-20020082394-A1 | Localization and characterization of the wilms' tumor gene | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2002-06-27 | — | — | US | disclosed |
| US-6316599-B1 | PREFERENTIAL ANTIBODY FOR USE IN THE DIAGNOSIS AND DETECTION AND TREATMENT OF TUMORS | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2001-11-13 | — | — | US | disclosed |
| US-5726288-A | DNA WITH NUCLEIC ACID SEQUENCE | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 1998-03-10 | — | — | US | disclosed |
| US-4551265-A | Fluorescent dyestuffs, processes for their preparation and their use as laser dyestuffs | BAYER AKTIENGESELLSCHAFT (DE) | 1985-11-05 | — | — | US | disclosed |
| US-4338258-A | Fluorescent dyestuffs, processes for their preparation and their use as laser dyestuffs | BAYER AKTIENGESELLSCHAFT (DE) | 1982-07-06 | — | — | US | disclosed |
| EP-0009679-B1 | FLUORESCENT DYESTUFFS OF THE STILBENE SERIES, PROCESS FOR THEIR PREPARATION AND THEIR USE IN THE WHITENING OF ORGANIC MATERIALS AND AS LASER DYESTUFFS | BAYER AG (DE) | 1982-04-21 | — | — | EP | disclosed |
| EP-0042181-A2 | Diphenyl derivatives | BAYER AG (DE) | 1981-12-23 | — | — | EP | disclosed |
| US-4301091-A | FOR WHITENING AND FOR LASER EMISSION | BAYER AKTIENGESELLSCHAFT (DE) | 1981-11-17 | — | — | US | disclosed |