Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 2/20 | 0.33 |
| ▸ | MMP2 | P08253 | 2/20 | 0.33 |
| ▸ | MMP9 | P14780 | 2/20 | 0.33 |
| ▸ | MMP8 | P22894 | 2/20 | 0.33 |
| ▸ | MMP13 | P45452 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2523004 | 0.94 | TSHR (0.46) | TSHRHPGDTHRBALDH1A1TP53 | |
| SCHEMBL31127917 | 0.94 | TSHR (0.46) | TSHRHPGDTHRBALDH1A1TP53 | |
| SCHEMBL30424942 | 0.94 | TSHR (0.38) | TSHRHPGDTHRBALDH1A1TP53 | |
| SCHEMBL7920244 | 0.91 | TSHR (0.38) | TSHRHPGDTHRBALDH1A1TP53 | |
| SCHEMBL560589 | 0.91 | TSHR (0.38) | TSHRHPGDTHRBALDH1A1TP53 | |
| SCHEMBL7920243 | 0.91 | TSHR (0.38) | TSHRHPGDTHRBALDH1A1TP53 | |
| SCHEMBL9873897 | 0.91 | TSHR (0.38) | TSHRHPGDTHRBALDH1A1TP53 | |
| SCHEMBL7906773 | 0.90 | TSHR (0.39) | TSHRHPGDTHRBALDH1A1TP53 | |
| SCHEMBL1930958 | 0.84 | TSHR (0.36) | TSHRHPGDTHRBALDH1A1TP53 | |
| SCHEMBL16178607 | 0.84 | TSHR (0.36) | TSHRHPGDTHRBALDH1A1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-4222805-A | — | — | None | — | — | JP | disclosed |
| CN-115768839-B | Charge imparting agent, chargeable resin composition, and charged nonwoven fabric | 三洋化成工业株式会社 | 2024-05-03 | — | — | CN | disclosed |
| WO-2020008860-A1 | LIQUID WAX FOR RUNWAY SURFACES, AND METHOD FOR MANUFACTURING SAME | 林 真子 | 2020-01-09 | — | — | WO | disclosed |
| US-9146578-B2 | Coating apparatus, method for producing electrophotographic photosensitive member and method for mass-producing electrophotographic photosensitive members | CANON KABUSHIKI KAISHA (JP) | 2015-09-29 | — | — | US | disclosed |
| US-8741391-B2 | Dip-coating process and method for making electrophotographic photosensitive member | CANON KABUSHIKI KAISHA (JP) | 2014-06-03 | — | — | US | disclosed |
| EP-2349590-B1 | DIP-COATING PROCESS | CANON KK (JP) | 2014-01-29 | — | — | EP | disclosed |
| US-20120045569-A1 | COATING APPARATUS, METHOD FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER AND METHOD FOR MASS-PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBERS | CANON KABUSHIKI KAISHA (JP) | 2012-02-23 | — | — | US | disclosed |
| EP-2420324-A1 | Coating apparatus, method for producing electrophotographic photosensitive member and method for mass-producing electrophotographic photosensitive members | Canon Kabushiki Kaisha (JP) | 2012-02-22 | — | — | EP | disclosed |
| US-20110200743-A1 | DIP-COATING PROCESS AND METHOD FOR MAKING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER | CANON KABUSHIKI KAISHA (JP) | 2011-08-18 | — | — | US | disclosed |
| EP-2349590-A1 | DIP-COATING PROCESS AND METHOD FOR MAKING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER | Canon Kabushiki Kaisha (JP) | 2011-08-03 | — | — | EP | disclosed |
| US-5488601-A | Photoelectric sensor, information recording system, and information recording method | DAI NIPPON PRINTING CO., LTD. (JP) | 1996-01-30 | — | — | US | disclosed |
| EP-0632059-A2 | Interpenetrating networks from unsaturated monomers and thermosetting resins | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-01-04 | — | — | EP | disclosed |
| EP-0595255-A2 | Photoelectric sensor, information recording system, and information recording method | DAI NIPPON PRINTING CO., LTD. (JP) | 1994-05-04 | — | — | EP | disclosed |
| US-5268783-A | Liquid crystal device including a polymer having a surface energy of at most 25 dyn/cm, display apparatus using same and display method using same | CANON KABUSHIKI KAISHA (JP) | 1993-12-07 | — | — | US | disclosed |
| EP-0507204-A1 | Liquid crystal device, display apparatus using same and display method using same | CANON KABUSHIKI KAISHA (JP) | 1992-10-07 | — | — | EP | disclosed |
| JP-H04222805-A | SURFACTANT, ANTIFOULING TREATMENT AGENT AND POLISHING AGENT | DAINIPPON INK & CHEM INC | 1992-08-12 | — | — | JP | disclosed |
| EP-0040841-B1 | PHOTOSENSITIVE MATERIAL | Daikin Kogyo Co., Ltd. (JP) | 1985-03-13 | — | — | EP | disclosed |
| US-4424325-A | COPOLYMER OF PERFLUOROALKYL OR PERFLUOROALKENYL ACRYLIC MONOMER | DAIKIN KOGYO CO., LTD. (JP) | 1984-01-03 | — | — | US | disclosed |
| EP-0040841-A1 | Photosensitive material | Daikin Kogyo Co., Ltd. (JP) | 1981-12-02 | — | — | EP | disclosed |
| US-3961122-A | POLYCARBONATES, POLYPHENYLENE ETHERS, POLYSTYRENE | GENERAL ELECTRIC COMPANY (US) | 1976-06-01 | — | — | US | disclosed |