SCHEMBL633501

SCHEMBL633501

CCCCON(OCCCC)c1nc(N(OCCCC)OCCCC)nc(N(OCCCC)OCCCC)n1

nearest known ligand 0.35

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.35
ADRB1 P08588 1/20 0.35
ADRB3 P13945 1/20 0.35
CYP3A4 P08684 3/20 0.31
CYP2D6 P10635 3/20 0.31
LMNA P02545 1/20 0.31
PKM P14618 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
TSHR P16473 1/20 0.31
CYP2C9 P11712 3/20 0.30
CYP2C19 P33261 3/20 0.30
CYP19A1 P11511 2/20 0.30
CYP1A2 P05177 2/20 0.30
ALDH1A1 P00352 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11421183 0.90 LMNA (0.31) LMNAPKMSMN1; SMN2
SCHEMBL9501689 0.87
SCHEMBL196668 0.84 TSHR (0.31) TSHR
SCHEMBL11765536 0.80 SLC29A1 (0.30)
SCHEMBL4630604 0.80
SCHEMBL16423547 0.79 LMNA (0.33) LMNAPKMSMN1; SMN2
SCHEMBL8411784 0.78 MEN1 (0.31)
SCHEMBL9501702 0.78
SCHEMBL8934295 0.77 LMNA (0.37) ADRB2ADRB1ADRB3LMNAPKM
SCHEMBL18843568 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2154162-B1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED MATERIAL SHOWA DENKO KK (JP) 2019-07-17 EP disclosed
US-8399569-B2 Reactive urethane compound having ether bond, curable composition, and cured material SHOWA DENKO K.K. (JP) 2013-03-19 US disclosed
EP-1866357-B1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF SHOWA DENKO KK (JP) 2012-02-22 EP disclosed
US-8044235-B2 (Meth) acryloyl group-containing aromatic isocyanate compound and production process thereof SHOWA DENKO K.K. (JP) 2011-10-25 US disclosed
EP-1812381-B1 ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE SHOWA DENKO KK (JP) 2011-02-16 EP disclosed
US-7790354-B2 Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same SHOWA DENKO K.K. (JP) 2010-09-07 US disclosed
US-20100160557-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION, AND CURED MATERIAL SHOWA DENKO K.K. (JP) 2010-06-24 US disclosed
EP-2154162-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED PRODUCT Showa Denko K.K. (JP) 2010-02-17 EP disclosed
US-7579066-B2 Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth) acrylate polymer and its use SHOWA DENKO K.K. (JP) 2009-08-25 US disclosed
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof SHOWA DENKO K.K. (JP) 2009-02-26 US disclosed
US-5677398-A CURABLE EPOXY RESIN, EPOXY COMPOUND OR ADDUCT COMPRISING A TETRAMETHYLSPIROBIINDENE-DIOL; RESISTANT OF SOLDERING, HEAT, MOISTURE, CORROSION, ACID, ALKALI, CHEMICAL; INKS FOR PRINTED-WIRING BOARD MITSUI TOATSU CHEMICALS, INC. (JP) 1997-10-14 US disclosed
EP-0584613-B1 Thermoplastic moulding matter for manufacture of inorganic sintered bodies as well as process for manufacture of inorganic sintered bodies BAYER AG (DE) 1996-10-16 EP disclosed
EP-0737701-A2 Epoxy acrylate resins and their uses MITSUI TOATSU CHEMICALS, Inc. (JP) 1996-10-16 EP disclosed
US-5538821-A SOLDER RESIST, RESIST FOR ELECTROLESS DEPOSITION OF GOLD, EPOXY NOVALAK RESIN REACTED WITH HYDROXYL COMPOUND AND POLYBASIC UNSATURATED CARBOXYLIC ACID NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1996-07-23 US disclosed
US-5439964-A Thermoplastic molding compounds for the production of inorganic sintered moldings and a process for the production of inorganic sintered moldings BAYER AKTIENGESELLSCHAFT (DE) 1995-08-08 US disclosed
EP-0624824-A1 Resist ink composition and cured article prepared therefrom NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1994-11-17 EP disclosed
US-5310813-A Copolymer includes alkyl (meth)acrylate and macromolecular monomers; high solids, low viscosity; automobiles, appliances TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) 1994-05-10 US disclosed
EP-0584613-A1 Thermoplastic moulding matter for manufacture of inorganic sintered bodies as well as process for manufacture of inorganic sintered bodies BAYER AG (DE) 1994-03-02 EP disclosed
US-5283213-A Moulding compounds for the production of inorganic sintered mouldings and a process for the production of inorganic sintered mouldings BAYER AKTIENGESELLSCHAFT (DE) 1994-02-01 US disclosed
EP-0531819-A1 Moulding composition for the production of inorganic sintered articles and process for the preparation of such articles BAYER AG (DE) 1993-03-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof PRMT5, ACR, PRMT1 ADRB2 2524/4885ADRB1 1590/4885ADRB3 2446/4885
US-20100160557-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION, AND CURED MATERIAL UNC119, MLLT1, H1-0 ADRB2 2276/4885ADRB1 2347/4885ADRB3 3437/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.