SCHEMBL4630604

SCHEMBL4630604

CCCCOC(O)N(OCCCC)c1nc(N(OCCCC)OCCCC)nc(N(OCCCC)OCCCC)n1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL633501 0.80 ADRB2 (0.35)
SCHEMBL9350845 0.77
SCHEMBL11526431 0.74 RECQL (0.33)
SCHEMBL11421183 0.72 LMNA (0.31)
SCHEMBL11765536 0.70 SLC29A1 (0.30)
SCHEMBL9501689 0.69
SCHEMBL16423547 0.69 LMNA (0.33)
SCHEMBL196668 0.67 TSHR (0.31)
SCHEMBL21669402 0.66 SLC29A1 (0.31)
SCHEMBL8808198 0.65 SPHK1 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1607391-B2 Continuous process for production of methylol melamines and use thereof for production of highly etherified melamine resins MELAMIN KEMICNA TOVARNA D D KOCEVJE (SI) 2012-10-17 EP claimed
EP-1607391-B1 Continuous process for production of methylol melamines and use thereof for production of highly etherified melamine resins MELAMIN KEMICNA TOVARNA D D KO (SI) 2008-05-14 EP claimed
US-6994944-B2 Radiation sensitive resin composition, cathode separator and EL display device JSR CORPORATION (JP) 2006-02-07 US claimed
JP-4045175-A None JP disclosed
EP-3173654-A1 FRICTION LINING, COMPRISING AN ETHERIFIED MELAMINE RESIN Valeo Matériaux de Friction (FR) 2017-05-31 EP disclosed
US-6994944-B2 Radiation sensitive resin composition, cathode separator and EL display device JSR CORPORATION (JP) 2006-02-07 US disclosed
US-20050260526-A1 Radiation sensitive resin composition, cathode separator and EL display device JSR CORPORATION (JP) 2005-11-24 US disclosed
CN-1535305-A Antifogging coating composition and coating material thereof �ձ���֬��ʽ���� 2004-10-06 CN disclosed
US-20020055059-A1 Radiation sensitive resin composition, cathode separator and el display device JSR CORPORATION (JP) 2002-05-09 US disclosed
EP-1193557-A1 Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device JSR Corporation (JP) 2002-04-03 EP disclosed
EP-0641305-B1 THERMOSETTING COATING COMPOSITIONS EASTMAN CHEM CO (US) 1997-01-15 EP disclosed
US-5453464-A Bis-acetoacetates and bis-beta-ketoesters, crosslinkers for hydroxy containing polymers, films EASTMAN CHEMICAL COMPANY (US) 1995-09-26 US disclosed
EP-0641305-A1 THERMOSETTING COATING COMPOSITIONS. EASTMAN CHEM CO (US) 1995-03-08 EP disclosed
US-5359125-A Using 2,2'-bisacetoacetate as crosslinking agent EASTMAN CHEMICAL COMPANY (US) 1994-10-25 US disclosed
US-5254637-A Curable enamel with 2,2*-bisacetoacetate crosslinking agents EASTMAN KODAK COMPANY (US) 1993-10-19 US disclosed
US-5247122-A 2,2'-bisacetoacetates useful as crosslinking agents EASTMAN KODAK COMPANY (US) 1993-09-21 US disclosed
WO-1992021646-A1 THERMOSETTING COATING COMPOSITIONS EASTMAN KODAK COMPANY (US) 1992-12-10 WO disclosed
JP-H0445175-A VEHICLE COMPOSITION FOR COLOR FILTER PRINTING INK DAINIPPON INK & CHEM INC 1992-02-14 JP disclosed