Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.32 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.32 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.32 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.32 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.32 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.32 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6740182 | 0.81 | KMT2A (0.33) | KMT2ASMN1; SMN2ALDH1A1GRIN2DGRIN3B | |
| SCHEMBL5195656 | 0.79 | KMT2A (0.33) | KMT2ASMN1; SMN2ALDH1A1GRIN2DGRIN3B | |
| SCHEMBL7459463 | 0.74 | SLC22A2 (0.34) | KMT2ASMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL28206894 | 0.73 | KMT2A (0.34) | KMT2ASMN1; SMN2GRIN2DGRIN3BGRIN1 | |
| SCHEMBL7462026 | 0.73 | KMT2A (0.33) | KMT2ASMN1; SMN2ALDH1A1EPHX2MEN1 | |
| SCHEMBL7457485 | 0.73 | GRIN2D (0.35) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL871816 | 0.72 | GRIN2D (0.36) | KMT2ASMN1; SMN2GRIN2DGRIN3BGRIN1 | |
| SCHEMBL23956811 | 0.71 | GRIN2D (0.32) | KMT2AGRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL15922449 | 0.71 | GRIN2D (0.37) | SMN1; SMN2GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL15922721 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |