SCHEMBL6740182

SCHEMBL6740182

CCC(O)(CC)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.56

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
ALDH1A1 P00352 2/20 0.32
GRIN2D O15399 3/20 0.32
GRIN3B O60391 3/20 0.32
GRIN1 Q05586 3/20 0.32
GRIN2A Q12879 3/20 0.32
GRIN2B Q13224 3/20 0.32
GRIN2C Q14957 3/20 0.32
GRIN3A Q8TCU5 3/20 0.32
EPHX2 P34913 1/20 0.32
MEN1 O00255 1/20 0.32
HSD11B1 P28845 1/20 0.32
SIGMAR1 Q99720 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7457485 0.86 GRIN2D (0.35) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
Methacrylic Acid SCHEMBL27136409 0.84 KMT2A (0.33) KMT2ASMN1; SMN2ALDH1A1EPHX2MEN1
SCHEMBL7462026 0.82 KMT2A (0.33) KMT2ASMN1; SMN2ALDH1A1EPHX2MEN1
SCHEMBL6346239 0.81 KMT2A (0.33) KMT2ASMN1; SMN2ALDH1A1GRIN2DGRIN3B
SCHEMBL6831527 0.80 PKM (0.41) ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL7459180 0.80 TSHR (0.37) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL5195656 0.79 KMT2A (0.33) KMT2ASMN1; SMN2ALDH1A1GRIN2DGRIN3B
SCHEMBL7457447 0.79 EPHX2 (0.39) KMT2AALDH1A1EPHX2MEN1HSD11B1
SCHEMBL7457460 0.78 GAA (0.44) KMT2AGRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL7458501 0.78 GRIN2D (0.50) SMN1; SMN2GRIN2DGRIN3BGRIN1GRIN2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117642454-A Curable resin composition 纳美仕有限公司 2024-03-01 CN disclosed
CN-117616061-A Curable resin composition 纳美仕有限公司 2024-02-27 CN disclosed
CN-117616067-A Curable resin composition 纳美仕有限公司 2024-02-27 CN disclosed
US-9951163-B2 (Meth)acrylate compound, (meth)acrylic copolymer and photosensitive resin composition containing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-04-24 US disclosed
US-9840465-B2 Antiviral compounds UNIV BRIGHAM YOUNG (US) 2017-12-12 US disclosed
US-9840465-B2 Antiviral compounds UNIV BRIGHAM YOUNG (US) 2017-12-12 US disclosed
CN-102976891-B Process for producing asymmetric tertiary alcohol and (meth) acrylic ester DAICEL CORP. (JP) 2016-02-10 CN disclosed
US-20150368196-A1 ANTIVIRAL COMPOUNDS UNIV BRIGHAM YOUNG (US) 2015-12-24 US disclosed
EP-2950789-A2 ANTIVIRAL COMPOUNDS Brigham Young University (US) 2015-12-09 EP disclosed
CN-105111043-A Method for preparing asymmetric tertiary alcohol and (methyl) acrylic ester DAICEL LTD 2015-12-02 CN disclosed
US-20030180662-A1 Acid-sensitive compound and resin composition for photoresist DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-09-25 US disclosed
US-6552143-B2 Addition polymer including units of 1-oxo-perhydro-5,6-didehydro-4,7-methanoisobenzofuran; making a semiconductor using the photoresist; high adhesion, fine patterns DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-04-22 US disclosed
US-20020169266-A1 Polymeric compound and resin composition for photoresist DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-11-14 US disclosed
US-20020016516-A1 Hydrocarbon bonded to a carbon atom which is bonded to a hydroxyl group, a methane group, and an adamantane ring; or its protected derivatives; alcohol intermediates for acrylic ester monomers for hydrophilic, adhesive photoresists DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-02-07 US disclosed
US-6344590-B1 HYDROCARBON BONDED TO A CARBON ATOM WHICH IS BONDED TO A HYDROXYL GROUP, A METHANE GROUP, AND AN ADAMANTANE RING; OR ITS PROTECTED DERIVATIVES; ALCOHOL INTERMEDIATES FOR ACRYLIC ESTER MONOMERS FOR HYDROPHILIC, ADHESIVE PHOTORESISTS DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-02-05 US disclosed
EP-1172384-A1 POLYMER FOR PHOTORESISTS AND RESIN COMPOSITIONS FOR PHOTORESISTS Daicel Chemical Industries, Ltd. (JP) 2002-01-16 EP disclosed
EP-1172694-A1 POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST Daicel Chemical Industries, Ltd. (JP) 2002-01-16 EP disclosed
EP-1043298-A1 PROCESSES FOR THE PREPARATION OF ALCOHOLS Daicel Chemical Industries, Ltd. (JP) 2000-10-11 EP disclosed
EP-1000924-A1 ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST Daichel Chemical Industries Ltd (JP) 2000-05-17 EP disclosed
EP-0990632-A1 ADAMANTANEMETHANOL DERIVATIVES AND PROCESS FOR THE PREPARATION THEREOF Daicel Chemical Industries, Ltd. (JP) 2000-04-05 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020016516-A1 Hydrocarbon bonded to a carbon atom which is bonded to a hydroxyl group, a methane group, and an adamantane ring; or its protected derivatives; alcohol intermediates for acrylic ester monomers for hydrophilic, adhesive photoresists ADH1A, ADGRF1, ADGRE5 KMT2A 1874/4885SMN1; SMN2 3876/4885ALDH1A1 47/4885
US-20150368196-A1 ANTIVIRAL COMPOUNDS ACE, ADA, MAVS KMT2A 2650/4885SMN1; SMN2 4527/4885ALDH1A1 380/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.