SCHEMBL5195656

SCHEMBL5195656

CCC(C)(O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.54

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.33
MEN1 O00255 2/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.32
ALDH1A1 P00352 2/20 0.31
GRIN2D O15399 3/20 0.31
GRIN3B O60391 3/20 0.31
GRIN1 Q05586 3/20 0.31
GRIN2A Q12879 3/20 0.31
GRIN2B Q13224 3/20 0.31
GRIN2C Q14957 3/20 0.31
GRIN3A Q8TCU5 3/20 0.31
EPHX2 P34913 1/20 0.31
HSD11B1 P28845 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7460528 0.87 GRIN2D (0.34) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
Methacrylic Acid SCHEMBL27133680 0.84 KMT2A (0.32) KMT2AMEN1SMN1; SMN2ALDH1A1EPHX2
SCHEMBL7452744 0.83 KMT2A (0.33) KMT2AMEN1CYP2D6CYP2C19SMN1; SMN2
SCHEMBL7451991 0.81 TSHR (0.36) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL7463128 0.81 PKM (0.40) ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL7456335 0.79 EPHX2 (0.38) KMT2AMEN1CYP2D6CYP2C19ALDH1A1
SCHEMBL7452669 0.79 GAA (0.43) KMT2AMEN1GRIN2DGRIN3BGRIN1
SCHEMBL7461656 0.79 GRIN2D (0.49) SMN1; SMN2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL6346239 0.79 KMT2A (0.33) KMT2AMEN1SMN1; SMN2ALDH1A1GRIN2D
SCHEMBL6740182 0.79 KMT2A (0.33) KMT2AMEN1SMN1; SMN2ALDH1A1GRIN2D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11377415-B2 Method for converting N,N-dialkylamide compound into ester compound using complex of fourth-period transition metal as catalyst TAKASAGO INTERNATIONAL CORPORATION (JP) 2022-07-05 US disclosed
EP-3760607-A1 METHOD FOR CONVERTING N,N-DIALKYLAMIDE COMPOUND INTO ESTER COMPOUND USING COMPLEX OF FOURTH-PERIOD TRANSITION METAL AS CATALYST Takasago International Corporation (JP) 2021-01-06 EP disclosed
US-20200399200-A1 METHOD FOR CONVERTING N,N-DIALKYLAMIDE COMPOUND INTO ESTER COMPOUND USING COMPLEX OF FOURTH-PERIOD TRANSITION METAL AS CATALYST TAKASAGO INTERNATIONAL CORPORATION (JP) 2020-12-24 US disclosed
US-9951163-B2 (Meth)acrylate compound, (meth)acrylic copolymer and photosensitive resin composition containing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-04-24 US disclosed
US-20170275241-A1 TRANSESTERIFICATION REACTION BY MEANS OF IRON CATALYST KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION (JP) 2017-09-28 US disclosed
EP-3124114-A1 TRANSESTERIFICATION REACTION BY MEANS OF IRON CATALYST Kyushu University, National University Corporation (JP) 2017-02-01 EP disclosed
CN-102976891-B Process for producing asymmetric tertiary alcohol and (meth) acrylic ester DAICEL CORP. (JP) 2016-02-10 CN disclosed
CN-105111043-A Method for preparing asymmetric tertiary alcohol and (methyl) acrylic ester DAICEL LTD 2015-12-02 CN disclosed
US-20140205947-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2014-07-24 US disclosed
US-20140205947-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2014-07-24 US disclosed
US-6806335-B2 FOR USE IN FINE PATTERNING OF SEMICONDUCTORS DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2004-10-19 US disclosed
US-6692889-B1 COPOLYMERS CONTAINING DERIVATIZED ADAMANTANYL ACRYLATE FUNCTIONALITY; ETCHING RESISTANCE DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2004-02-17 US disclosed
US-20040006189-A1 Polymeric compound and resin composition for photoresist DAICEL CHEMICAL INDUSTRIES, LTD. 2004-01-08 US disclosed
US-20030083529-A1 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-05-01 US disclosed
US-6552143-B2 Addition polymer including units of 1-oxo-perhydro-5,6-didehydro-4,7-methanoisobenzofuran; making a semiconductor using the photoresist; high adhesion, fine patterns DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-04-22 US disclosed
EP-1288186-A2 Vinyl ether compounds and preparation process thereof Daicel Chemical Industries, Ltd. (JP) 2003-03-05 EP disclosed
US-20020169266-A1 Polymeric compound and resin composition for photoresist DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-11-14 US disclosed
EP-1172694-A1 POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST Daicel Chemical Industries, Ltd. (JP) 2002-01-16 EP disclosed
EP-1172384-A1 POLYMER FOR PHOTORESISTS AND RESIN COMPOSITIONS FOR PHOTORESISTS Daicel Chemical Industries, Ltd. (JP) 2002-01-16 EP disclosed
EP-1043298-A1 PROCESSES FOR THE PREPARATION OF ALCOHOLS Daicel Chemical Industries, Ltd. (JP) 2000-10-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11377415-B2 Method for converting N,N-dialkylamide compound into ester compound using complex of fourth-period transition metal as catalyst NEK4, TENT4A, TCF4 KMT2A 920/4885MEN1 328/4885CYP2D6 1763/4885
US-20170275241-A1 TRANSESTERIFICATION REACTION BY MEANS OF IRON CATALYST FASN, TECR, CYP4F3 KMT2A 2161/4885MEN1 584/4885CYP2D6 284/4885
US-20200399200-A1 METHOD FOR CONVERTING N,N-DIALKYLAMIDE COMPOUND INTO ESTER COMPOUND USING COMPLEX OF FOURTH-PERIOD TRANSITION METAL AS CATALYST NEK4, TENT4A, TCF4 KMT2A 920/4885MEN1 328/4885CYP2D6 1763/4885
US-20030083529-A1 Process for producing vinyl ether compounds SRD5A2, RPS4X, RUVBL2 KMT2A 1251/4885MEN1 2290/4885CYP2D6 504/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.