Benzoic Acid

Benzoic Acid

SCHEMBL6348108

C=C(C)C(=O)O.O=C(O)c1ccccc1

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D

The experimentally established mechanism targets of Benzoic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.67
DAO P14920 1/20 0.67
NAPRT Q6XQN6 1/20 0.67
CES2 O00748 4/20 0.56
CES1 P23141 4/20 0.56
SRD5A2 P31213 2/20 0.56
TP53 P04637 1/20 0.50
ELANE P08246 1/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
LMNA P02545 1/20 0.47
MAPT P10636 1/20 0.47
XBP1 P17861 1/20 0.47
ATM Q13315 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
ALDH1A1 P00352 3/20 0.46
TRPA1 O75762 1/20 0.45
CYP2C8 P10632 1/20 0.44
CYP2C9 P11712 1/20 0.44
KDM4E B2RXH2 1/20 0.44
KMO O15229 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoic Acid SCHEMBL28076125 0.98 TSHR (0.64) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL9785834 0.98 TSHR (0.64) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL28076324 0.98 TSHR (0.64) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL27830622 0.98 TSHR (0.64) TSHRDAONAPRTCES2CES1
Terephthalic Acid SCHEMBL28859780 0.90 TSHR (0.63) TSHRDAONAPRTCES2CES1
Terephthalic Acid SCHEMBL10736240 0.90 TSHR (0.63) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL27642009 0.90 TSHR (0.54) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL3410022 0.87 TSHR (0.50) TSHRDAONAPRTCES2CES1
Benzophenone SCHEMBL10900098 0.86 ALDH1A1 (0.67) TSHRDAONAPRTCES2CES1
Methacrylic Acid SCHEMBL3468305 0.86 CES2 (0.50) TSHRDAONAPRTCES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9234312-B2 Sizing agent for reinforcement fibers, and application thereof MATSUMOTO YUSHI-SEIYAKU CO., LTD. (JP) 2016-01-12 US claimed
WO-2024127878-A1 SIZING AGENT FOR FIBERS AND USE THEREOF 松本油脂製薬株式会社 2024-06-20 WO disclosed
WO-2024075386-A1 ACTIVE ENERGY RAY-CURABLE INK COMPOSITION FOR SURFACE PRINTING サカタインクス株式会社 2024-04-11 WO disclosed
WO-2024047976-A1 PHOTOCURABLE INK-JET INK COMPOSITION サカタインクス株式会社 2024-03-07 WO disclosed
WO-2024042847-A1 SIZING AGENT FOR FIBERS AND USE THEREOF 松本油脂製薬株式会社 2024-02-29 WO disclosed
WO-2024029176-A1 PHOTOCURABLE INKJET INK COMPOSITION KJケミカルズ株式会社 2024-02-08 WO disclosed
WO-2023100901-A1 SIZING AGENT FOR INORGANIC FIBERS AND INORGANIC FIBERS 竹本油脂株式会社 2023-06-08 WO disclosed
US-11639064-B2 Image forming method RICOH COMPANY, LTD. (JP) 2023-05-02 US disclosed
EP-3769925-B1 PRINTING METHOD AND PRINTING DEVICE RICOH CO LTD (JP) 2022-06-29 EP disclosed
US-20220161585-A1 METHOD FOR PRODUCING PRINTED PRODUCT, APPARATUS FOR PRODUCING PRINTED PRODUCT, AND SET FOR PRINTING RICOH COMPANY, LTD. (JP) 2022-05-26 US disclosed
WO-2014054763-A1 PHOTOPOLYMERIZABLE COMPOSITION, PHOTOPOLYMERIZABLE INKJET INK, AND INK CARTRIDGE RICOH COMPANY, LTD. (JP) 2014-04-10 WO disclosed
US-20130321539-A1 PHOTOPOLYMERIZABLE INKJET INK, INK CARTRIDGE, AND INKJET PRINTING DEVICE RICOH COMPANY, LTD. (JP) 2013-12-05 US disclosed
EP-2669343-A1 Photopolymerizable inkjet ink, ink cartridge, and inkjet printing device Ricoh Company, Ltd. (JP) 2013-12-04 EP disclosed
WO-2013172480-A1 PHOTOPOLYMERIZABLE COMPOSITION, PHOTOPOLYMERIZABLE INKJET INK, AND INK CARTRIDGE RICOH COMPANY, LTD. (JP) 2013-11-21 WO disclosed
WO-2013069580-A1 PHOTOPOLYMERIZABLE INKJET INK RICOH COMPANY, LTD. (JP) 2013-05-16 WO disclosed
US-6969578-B2 For exposure to actinic radiation; data processing EASTMAN KODAK COMPANY (US) 2005-11-29 US disclosed
US-20040038146-A1 For exposure to actinic radiation; data processing EASTMAN KODAK COMPANY 2004-02-26 US disclosed
EP-1391886-A1 Optical recording material EASTMAN KODAK COMPANY (US) 2004-02-25 EP disclosed
US-5932625-A MONOMER COMPONENT COMPRISING: 30 TO 70 WT. % OF AT LEAST ONE POLYFUNCTIONAL UNSATURATED MONOMER HAVING AT LEAST ONE CYCLIC STRUCTURE, AND 70 TO 30 WT. % OF AT LEAST ONE MONOFUNCTIONAL UNSATURATED MONOMER HAVING AT LEAST ONE CYCLIC STRUCTURE DSM N.V. (NL) 1999-08-03 US disclosed
US-5874041-A MONOMERIC URETHANE-BOND POLYFUNCTIONAL (METH)ACRYLATE AND AN ETHYLENICALLY UNSATURATED MONOMER CONTAINING A CYCLIC STRUCTURE DSM N.V. (NL) 1999-02-23 US disclosed