Known targets — ChEMBL curated mechanism
CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D
The experimentally established mechanism targets of Benzoic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | DAO | P14920 | 1/20 | 0.50 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.50 |
| ▸ | CES1 | P23141 | 3/20 | 0.44 |
| ▸ | CES2 | O00748 | 2/20 | 0.44 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.44 |
| ▸ | ELANE | P08246 | 1/20 | 0.39 |
| ▸ | EGFR | P00533 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | XBP1 | P17861 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | APEX1 | P27695 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Terephthalic Acid SCHEMBL216498 | 0.93 | TSHR (0.46) | TSHRDAONAPRTSRD5A2TP53 | |
| Benzoic Acid SCHEMBL4117667 | 0.92 | DAO (0.45) | TSHRDAONAPRTCES1CES2 | |
| Benzoic Acid SCHEMBL28085428 | 0.92 | DAO (0.45) | TSHRDAONAPRTCES1CES2 | |
| Benzoic Acid SCHEMBL28340983 | 0.88 | TSHR (0.48) | TSHRDAONAPRTCES1CES2 | |
| Benzoic Acid SCHEMBL28094910 | 0.88 | TSHR (0.48) | TSHRDAONAPRTCES1CES2 | |
| Benzoic Acid SCHEMBL2356436 | 0.87 | TSHR (0.67) | TSHRDAONAPRTCES1CES2 | |
| Benzoic Acid SCHEMBL2411132 | 0.87 | TSHR (0.67) | TSHRDAONAPRTCES1CES2 | |
| Benzoic Acid SCHEMBL9563651 | 0.87 | TSHR (0.67) | TSHRDAONAPRTCES1CES2 | |
| Benzoic Acid SCHEMBL6348108 | 0.87 | TSHR (0.67) | TSHRDAONAPRTCES1CES2 | |
| Benzoic Acid SCHEMBL1681320 | 0.87 | TSHR (0.67) | TSHRDAONAPRTCES1CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119173600-A | Insulating adhesive tape | 爱天思株式会社 | 2024-12-20 | — | — | CN | disclosed |
| WO-2023219047-A1 | INSULATIVE ADHESIVE TAPE | 東洋インキＳＣホールディングス株式会社 | 2023-11-16 | — | — | WO | disclosed |
| EP-3018118-B1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2023-07-05 | — | — | EP | disclosed |
| CN-107848963-B | Acid-resistant alkali-producing agent and/or radical-producing agent, and curable resin composition containing same | 富士胶片和光纯药株式会社 | 2020-11-03 | — | — | CN | disclosed |
| EP-3327002-B1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-10428014-B2 | Base generator, base-reactive composition containing said base generator, and base generation method | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3098226-B1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2018-12-12 | — | — | EP | disclosed |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2018-10-16 | — | — | US | disclosed |
| US-20160340374-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| EP-3018118-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | Wako Pure Chemical Industries, Ltd. (JP) | 2016-05-11 | — | — | EP | disclosed |
| US-20160122292-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2016-05-05 | — | — | US | disclosed |
| US-8378002-B2 | Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method | FUJIFILM CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| US-20100015360-A1 | AQUEOUS INK COMPOSITION, AQUEOUS INK COMPOSITION FOR INKJET RECORDING, AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2010-01-21 | — | — | US | disclosed |
| EP-2145932-A1 | Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method | Fujifilm Corporation (JP) | 2010-01-20 | — | — | EP | disclosed |
| US-7217743-B2 | Curable white ink | KONICA CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| US-6900250-B2 | Polymerizable composition | TOYO INK MFG. CO., LTD. (JP) | 2005-05-31 | — | — | US | disclosed |
| US-20040019128-A1 | Curable white ink | KONICA CORPORATION (JP) | 2004-01-29 | — | — | US | disclosed |
| US-20030212162-A1 | Photopolymerization using photoinitiators | TOYO INK MFG. CO., LTD. (JP) | 2003-11-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | REV1, RER1, CBR1 | TSHR 1154/4885DAO 30/4885NAPRT 2042/4885 |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | BLM, HPRT1, BROX | TSHR 1373/4885DAO 803/4885NAPRT 418/4885 |
| US-10428014-B2 | Base generator, base-reactive composition containing said base generator, and base generation method | HPRT1, GNG2, BLM | TSHR 2081/4885DAO 587/4885NAPRT 1021/4885 |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | REV1, RER1, CBR1 | TSHR 1154/4885DAO 30/4885NAPRT 2042/4885 |
| US-20160340374-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | ENPP3, GNG2, ENPP1 | TSHR 602/4885DAO 626/4885NAPRT 1358/4885 |
| US-20160122292-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | GNG2, EPHX2, ARHGEF1 | TSHR 2058/4885DAO 319/4885NAPRT 2250/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.