Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 5/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 2/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6346994 | 0.82 | EPHX2 (0.46) | EPHX2TSHRNPSR1ALDH1A1POLB | |
| SCHEMBL6495033 | 0.82 | EPHX2 (0.50) | EPHX2TSHRNPSR1ALDH1A1POLB | |
| SCHEMBL5269895 | 0.81 | EPHX2 (0.44) | EPHX2TSHRNPSR1ALDH1A1POLB | |
| SCHEMBL6346843 | 0.79 | EPHX2 (0.43) | EPHX2TSHRNPSR1ALDH1A1POLB | |
| SCHEMBL6451090 | 0.79 | ALDH1A1 (0.39) | TSHRALDH1A1POLBHSD11B1L3MBTL1 | |
| SCHEMBL6497191 | 0.79 | — | — | |
| SCHEMBL6349272 | 0.77 | EPHX2 (0.41) | EPHX2TSHRNPSR1ALDH1A1POLB | |
| SCHEMBL23815408 | 0.76 | EPHX2 (0.52) | EPHX2TSHRNPSR1ALDH1A1POLB | |
| SCHEMBL1398388 | 0.76 | EPHX2 (0.52) | EPHX2TSHRNPSR1ALDH1A1POLB | |
| SCHEMBL1847665 | 0.76 | EPHX2 (0.52) | EPHX2TSHRNPSR1ALDH1A1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-6949615-B2 | Monomer having electron-withdrawing group and process for preparing the same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-09-27 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |
| EP-1331216-A1 | MONOMERS HAVING ELECTRON-WITHDRAWING GROUPS AND PROCESSES FOR PREPARING THE SAME | Daicel Chemical Industries, Ltd. (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-20030059710-A1 | Monomer having electron-withdrawing group and process for preparing the same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-03-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030059710-A1 | Monomer having electron-withdrawing group and process for preparing the same | RFC3, RFC2, MAPRE1 | EPHX2 1930/4885TSHR 783/4885NPSR1 1335/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.