SCHEMBL6348493

SCHEMBL6348493

O=C(OC1CCCCO1)C1(C(=O)OC2CCCCO2)CCCC1

nearest known ligand 0.36

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
MAPT P10636 1/20 0.31
CYP2C19 P33261 1/20 0.31
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6354331 0.98 MEN1 (0.33) MEN1KMT2AMAPTCYP2C19
SCHEMBL28523883 0.89 MAPT (0.33) MAPTCYP2C19
SCHEMBL5011348 0.81 MEN1 (0.32) MEN1KMT2AMAPTCYP2C19
SCHEMBL5568688 0.80 MEN1 (0.35) MEN1KMT2AEPHX2
SCHEMBL1306032 0.78 MEN1 (0.32) MEN1KMT2AEPHX2
SCHEMBL6554397 0.75 MEN1 (0.38) MEN1KMT2AEPHX2
SCHEMBL9354384 0.75 MEN1 (0.41) MEN1KMT2AEPHX2
SCHEMBL7716652 0.75 MEN1 (0.41) MEN1KMT2AEPHX2
SCHEMBL28647211 0.75 MEN1 (0.38) MEN1KMT2AMAPTEPHX2
SCHEMBL5563190 0.75 MEN1 (0.35) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6974658-B2 HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS KABUSHIKI KAISHA TOSHIBA (JP) 2005-12-13 US disclosed