SCHEMBL6354331

SCHEMBL6354331

O=C(OC1CCCCO1)C1(C(=O)OC2CCCCO2)CCCCC1

nearest known ligand 0.35

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
CYP2C19 P33261 1/20 0.33
MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6348493 0.98 MEN1 (0.34) MEN1KMT2ACYP2C19MAPT
SCHEMBL28523883 0.91 MAPT (0.33) CYP2C19MAPT
SCHEMBL5011348 0.83 MEN1 (0.32) MEN1KMT2ACYP2C19MAPT
SCHEMBL5568688 0.79 MEN1 (0.35) MEN1KMT2A
SCHEMBL28647211 0.77 MEN1 (0.38) MEN1KMT2AMAPT
SCHEMBL1306032 0.77 MEN1 (0.32) MEN1KMT2A
SCHEMBL13979849 0.75 CHRM3 (0.55) MEN1KMT2ACYP2C19
SCHEMBL6554397 0.74 MEN1 (0.38) MEN1KMT2A
SCHEMBL9354384 0.74 MEN1 (0.41) MEN1KMT2A
SCHEMBL7716652 0.74 MEN1 (0.41) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6974658-B2 HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS KABUSHIKI KAISHA TOSHIBA (JP) 2005-12-13 US disclosed