⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylamine SCHEMBL4518356 | 1.00 | DNM1 (0.33) | — | |
| Ethylamine SCHEMBL979530 | 1.00 | — | — | |
| Ethylamine SCHEMBL28448202 | 1.00 | — | — | |
| Ethylamine SCHEMBL342521 | 1.00 | — | — | |
| Ethylamine SCHEMBL342520 | 1.00 | DNM1 (0.33) | — | |
| Ethylamine SCHEMBL28351218 | 0.94 | DNM1 (0.31) | — | |
| Ethylamine SCHEMBL28658917 | 0.94 | — | — | |
| Ethylamine SCHEMBL15646032 | 0.94 | — | — | |
| Ethylamine SCHEMBL476178 | 0.94 | — | — | |
| Ethylamine SCHEMBL5742265 | 0.94 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 473 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12557622-B2 | Method for fabricating a semiconductor device with a composite barrier structure | NANYA TECHNOLOGY CORPORATION (TW) | 2026-02-17 | — | — | US | claimed |
| US-12358933-B2 | Meta-POSS (meta-polyhedral oligomeric silsesquioxane) compound, a preparation method thereof, and a composition containing the meta-POSS compound prepared by the preparation method | PIOCEL CO., LTD. (KR) | 2025-07-15 | — | — | US | claimed |
| US-12341054-B2 | Method for fabricating semiconductor device with chelating agent | NANYA TECHNOLOGY CORPORATION (TW) | 2025-06-24 | — | — | US | claimed |
| US-20250109153-A1 | A novel meta-POSS (meta-polyhedral oligomeric silsesquioxane) compound, a preparation method thereof, and a composition containing the meta-POSS compound prepared by the preparation method | PIOCEL CO., LTD. (KR) | 2025-04-03 | — | — | US | claimed |
| CN-117524975-A | Method for manufacturing semiconductor device | 南亚科技股份有限公司 | 2024-02-06 | — | — | CN | claimed |
| CN-116895517-A | Semiconductor device and method for manufacturing the same | 南亚科技股份有限公司 | 2023-10-17 | — | — | CN | claimed |
| US-20230317514-A1 | SEMICONDUCTOR DEVICE WITH COMPOSITE BARRIER STRUCTURE AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2023-10-05 | — | — | US | claimed |
| US-20230317508-A1 | METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH PRE-CLEANING TREATMENT | NANYA TECHNOLOGY CORPORATION (TW) | 2023-10-05 | — | — | US | claimed |
| WO-2023153586-A1 | NOVEL META-POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (META-POSS) COMPOUND, PRODUCTION METHOD THEREFOR, AND COMPOSITION COMPRISING META-POSS COMPOUND PRODUCED THEREBY | 주식회사 파이오셀 | 2023-08-17 | — | — | WO | claimed |
| US-20230015653-A1 | HIGH-CAPACITY BATTERY ELECTRODES WITH IMPROVED BINDERS, CONSTRUCTION, AND PERFORMANCE | SILA NANOTECHNOLOGIES, INC. | 2023-01-19 | — | — | US | claimed |
| EP-1937738-A1 | ONE-COMPONENT POLYURETHANE SYSTEMS THAT ARE DEVOID OF METAL | Evonik Degussa GmbH (DE) | 2008-07-02 | — | — | EP | claimed |
| EP-1844084-A1 | HIGHLY REACTIVE URETDIONE GROUP-CONTAINING POLYURETHANE COMPOSITIONS BASED ON 1,4-DIISOCYANATO-DICYCLOHEXYL METHANE | Degussa GmbH (DE) | 2007-10-17 | — | — | EP | claimed |
| CN-101013273-A | Cleaning formulations | AIR PROD & CHEM (US) | 2007-08-08 | — | — | CN | claimed |
| US-20070179072-A1 | Cleaning formulations | VERSUM MATERIALS US, LLC | 2007-08-02 | — | — | US | claimed |
| EP-1813667-A1 | Cleaning formulations | Air Products and Chemicals, Inc. (US) | 2007-08-01 | — | — | EP | claimed |
| WO-2007045615-A1 | ONE-COMPONENT POLYURETHANE SYSTEMS THAT ARE DEVOID OF METAL | EVONIK DEGUSSA GMBH (DE) | 2007-04-26 | — | — | WO | claimed |
| WO-2006069839-A1 | HIGHLY REACTIVE URETDIONE GROUP-CONTAINING POLYURETHANE COMPOSITIONS BASED ON 1,4-DIISOCYANATO-DICYCLOHEXYL METHANE | DEGUSSA GMBH (DE) | 2006-07-06 | — | — | WO | claimed |
| US-20060057094-A1 | Hair styling composition comprising at least one hydrophilic polymeric high porosity material and at least one fixing polymer | L'OREAL S.A. (FR) | 2006-03-16 | — | — | US | claimed |
| US-20040009883-A1 | Resist stripping composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-15 | — | — | US | claimed |
| US-5684219-A | SEPARATION OF 1,1,1,3,3-PENTAFLUOROPROPANE FROM HYDROGEN FLUORIDE BY ADDITION OF SALT | LAROCHE INDUSTRIES INC. (US) | 1997-11-04 | — | — | US | claimed |