SCHEMBL6354463

SCHEMBL6354463

COCCOC(=O)Cc1ccc(O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
YWHAG P61981 1/20 0.50
ALDH1A1 P00352 2/20 0.49
GAA P10253 1/20 0.49
MET P08581 2/20 0.48
CYP4F2 P78329 1/20 0.47
CYP4A11 Q02928 1/20 0.47
CA2 P00918 2/20 0.47
CAMK2A Q9UQM7 1/20 0.47
L3MBTL1 Q9Y468 2/20 0.46
MAPK1 P28482 1/20 0.46
ALOX5 P09917 1/20 0.46
NPC1 O15118 1/20 0.45
MAPT P10636 1/20 0.45
RAB9A P51151 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
SENP1 Q9P0U3 1/20 0.45
TSHR P16473 2/20 0.44
CYP19A1 P11511 1/20 0.44
FNTA P49354 1/20 0.43
FNTB P49356 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6355250 0.88 CA2 (0.43) YWHAGALDH1A1GAAMETCYP4F2
SCHEMBL10175300 0.86 ALDH1A1 (0.49) YWHAGALDH1A1GAACYP4F2CYP4A11
SCHEMBL15153035 0.85 YWHAG (0.62) YWHAGALDH1A1METCYP4F2CYP4A11
SCHEMBL16659807 0.84 TDP1 (0.58) ALDH1A1GAAMETCYP4F2CYP4A11
SCHEMBL19336121 0.84 ALDH1A1 (0.48) YWHAGALDH1A1GAACYP4F2CYP4A11
SCHEMBL13826445 0.84 ALDH1A1 (0.48) YWHAGALDH1A1GAACYP4F2CYP4A11
SCHEMBL16661855 0.84 ALDH1A1 (0.68) ALDH1A1GAAL3MBTL1MAPTSMN1; SMN2
SCHEMBL9736831 0.84 ALDH1A1 (0.61) ALDH1A1L3MBTL1MAPK1ALOX5MAPT
SCHEMBL1885468 0.84 ALDH1A1 (0.58) YWHAGALDH1A1GAACA2CAMK2A
Ammonia Solution, Strong SCHEMBL27732594 0.82 ALDH1A1 (0.59) ALDH1A1GAAL3MBTL1MAPK1ALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6974658-B2 HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS KABUSHIKI KAISHA TOSHIBA (JP) 2005-12-13 US disclosed