SCHEMBL6355250

SCHEMBL6355250

COCCOCOC(=O)Cc1ccc(O)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.43
CAMK2A Q9UQM7 1/20 0.43
ALDH1A1 P00352 2/20 0.42
GAA P10253 1/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
MAPK1 P28482 1/20 0.42
SENP1 Q9P0U3 1/20 0.42
KDM4E B2RXH2 1/20 0.41
GLA P06280 1/20 0.41
CYP4F2 P78329 1/20 0.40
CYP4A11 Q02928 1/20 0.40
YWHAG P61981 1/20 0.40
ESR1 P03372 1/20 0.40
ESR2 Q92731 1/20 0.40
FNTA P49354 1/20 0.40
FNTB P49356 1/20 0.40
MET P08581 1/20 0.39
NPC1 O15118 1/20 0.39
MAPT P10636 1/20 0.39
RAB9A P51151 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6354463 0.88 YWHAG (0.50) CA2CAMK2AALDH1A1GAAL3MBTL1
SCHEMBL19336121 0.77 ALDH1A1 (0.48) ALDH1A1GAAL3MBTL1MAPK1KDM4E
SCHEMBL18998968 0.76 TDP1 (0.53) ALDH1A1GAAL3MBTL1MAPK1KDM4E
SCHEMBL30704448 0.76 ALDH1A1 (0.44) ALDH1A1GAAL3MBTL1MAPK1KDM4E
SCHEMBL1586504 0.76 ALDH1A1 (0.51) ALDH1A1GAAL3MBTL1KDM4EGLA
SCHEMBL14194526 0.76 CA2 (0.48) CA2CAMK2AALDH1A1L3MBTL1MAPK1
SCHEMBL1885468 0.76 ALDH1A1 (0.58) CA2CAMK2AALDH1A1GAAL3MBTL1
SCHEMBL1179218 0.75 CYP4Z1 (0.55) CA2CAMK2AALDH1A1L3MBTL1MAPK1
SCHEMBL29277507 0.75 YWHAG (0.47) CA2CAMK2AALDH1A1GAAL3MBTL1
SCHEMBL7052847 0.75 IDO1 (0.46) CA2L3MBTL1ESR1ESR2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6974658-B2 HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS KABUSHIKI KAISHA TOSHIBA (JP) 2005-12-13 US disclosed