Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.52 |
| ▸ | TSHR | P16473 | 5/20 | 0.52 |
| ▸ | THRB | P10828 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.42 |
| ▸ | TP53 | P04637 | 2/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL284310 | 0.87 | TSHR (0.54) | ALDH1A1TSHRTHRBHSD17B10TP53 | |
| SCHEMBL13248945 | 0.86 | ALDH1A1 (0.54) | ALDH1A1TSHRTHRBHSD17B10TP53 | |
| SCHEMBL284797 | 0.85 | TSHR (0.42) | ALDH1A1TSHRTHRBHSD17B10TP53 | |
| SCHEMBL12542192 | 0.83 | THRB (0.59) | ALDH1A1TSHRTHRBHSD17B10TP53 | |
| SCHEMBL21985904 | 0.82 | MEN1 (0.44) | ALDH1A1TSHRTHRBHSD17B10TP53 | |
| SCHEMBL6346837 | 0.82 | ALDH1A1 (0.37) | ALDH1A1TSHRTHRBHSD17B10TP53 | |
| SCHEMBL9298820 | 0.82 | ALDH1A1 (0.54) | ALDH1A1TSHRTHRBHSD17B10TP53 | |
| SCHEMBL167897 | 0.81 | — | — | |
| SCHEMBL166975 | 0.81 | — | — | |
| SCHEMBL938633 | 0.80 | ALDH1A1 (0.68) | ALDH1A1TSHRTHRBHSD17B10TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |