Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.46 |
| ▸ | PKM | P14618 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | CNR2 | P34972 | 3/20 | 0.36 |
| ▸ | CNR1 | P21554 | 2/20 | 0.35 |
| ▸ | ABL1 | P00519 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | RIN1 | Q13671 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | DPP4 | P27487 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL678337 | 0.83 | HSD11B1 (0.49) | HSD11B1PKMALDH1A1CNR2CNR1 | |
| SCHEMBL3878155 | 0.83 | HSD11B1 (0.49) | HSD11B1PKMALDH1A1CNR2CNR1 | |
| SCHEMBL587576 | 0.81 | HSD11B1 (0.49) | HSD11B1PKMALDH1A1CNR2CNR1 | |
| SCHEMBL5346781 | 0.79 | HSD11B1 (0.54) | HSD11B1PKMALDH1A1CNR2CNR1 | |
| SCHEMBL6451090 | 0.77 | ALDH1A1 (0.39) | HSD11B1ALDH1A1TSHRSMN1; SMN2L3MBTL1 | |
| SCHEMBL6388362 | 0.75 | HSD11B1 (0.50) | HSD11B1PKMALDH1A1CNR2CNR1 | |
| SCHEMBL4142469 | 0.75 | HSD11B1 (0.50) | HSD11B1PKMALDH1A1CNR2CNR1 | |
| SCHEMBL27763496 | 0.74 | HSD11B1 (0.58) | HSD11B1PKMALDH1A1CNR2CNR1 | |
| SCHEMBL14791285 | 0.74 | PKM (0.64) | HSD11B1PKMALDH1A1CNR2DPP4 | |
| SCHEMBL1150706 | 0.74 | PKM (0.64) | HSD11B1PKMALDH1A1CNR2DPP4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |