Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8942920 | 0.74 | CCR5 (0.32) | KDM4E | |
| SCHEMBL27364252 | 0.70 | — | — | |
| SCHEMBL14275665 | 0.68 | KDM4E (0.30) | KDM4E | |
| SCHEMBL8943039 | 0.68 | KDM4E (0.37) | KDM4E | |
| SCHEMBL6342823 | 0.68 | CYP19A1 (0.31) | — | |
| SCHEMBL18105691 | 0.68 | MAPT (0.36) | KDM4E | |
| Hydrochloric Acid SCHEMBL9068147 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL9068149 | 0.67 | — | — | |
| SCHEMBL11307797 | 0.66 | GPBAR1 (0.33) | — | |
| SCHEMBL10449251 | 0.64 | LMNA (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |