⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27524931 | 0.79 | — | — | |
| SCHEMBL18017058 | 0.78 | CES2 (0.53) | — | |
| SCHEMBL13143810 | 0.76 | TSHR (0.39) | — | |
| SCHEMBL6343116 | 0.76 | THRB (0.55) | — | |
| SCHEMBL17995568 | 0.76 | THRB (0.32) | — | |
| Methacrylic Acid SCHEMBL27495305 | 0.76 | THRB (0.45) | — | |
| SCHEMBL18213963 | 0.74 | CES2 (0.66) | — | |
| SCHEMBL18213961 | 0.74 | CES2 (0.66) | — | |
| Potassium Ion SCHEMBL25270213 | 0.74 | ALDH1A1 (0.37) | — | |
| SCHEMBL5335310 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |