SCHEMBL6358313

SCHEMBL6358313

OC(CCl)COCC(O)CCl.Oc1cccc2c(O)cccc12

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.42
HPGD P15428 2/20 0.42
MAPT P10636 2/20 0.42
ALOX15 P16050 2/20 0.42
APP P05067 1/20 0.42
THRB P10828 1/20 0.42
TSHR P16473 1/20 0.42
CASP1 P29466 1/20 0.42
SNCA P37840 1/20 0.42
RECQL P46063 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
IDO1 P14902 2/20 0.38
CYP1A2 P05177 3/20 0.38
CDK2 P24941 1/20 0.35
KDM4E B2RXH2 2/20 0.34
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
CYP3A4 P08684 1/20 0.34
PARP1 P09874 1/20 0.34
CYP2C9 P11712 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Resorcinol SCHEMBL6360863 0.79 CA2 (0.46) HSD17B10TSHRTDP1KDM4EALDH1A1
Hydroquinone SCHEMBL6350929 0.78 AR (0.38) HSD17B10HPGDMAPTALOX15TSHR
Phenol SCHEMBL28469017 0.77 CA1 (0.46) MAPTTSHRTDP1CYP1A2LMNA
SCHEMBL6351417 0.75 ADRB2 (0.41) HSD17B10HPGDMAPTALOX15APP
SCHEMBL202567 0.74 CA1 (0.45) HSD17B10TSHRKDM4EALDH1A1AR
SCHEMBL7086822 0.74 IDO1 (0.38) HSD17B10HPGDMAPTALOX15APP
SCHEMBL6353330 0.73 ESR1 (0.44) CYP3A4MEN1ESR1KMT2AESR2
SCHEMBL811510 0.72 CA1 (0.43) HSD17B10TSHRKDM4EALDH1A1AR
SCHEMBL19951506 0.72 CA1 (0.43) HSD17B10TSHRKDM4EALDH1A1AR
SCHEMBL6358310 0.72 CYP1A2 (0.57) HSD17B10TSHRTDP1CYP1A2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030149219-A1 Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom BORIACK CLINTON J (US) 2003-08-07 US claimed
US-6534621-B2 Epoxidizing an alpha-halohydrin intermediate produced from an in situ halide substitution-deesterification of an alpha-hydroxy ester derivative DOW GLOBAL TECHNOLOGIES INC. 2003-03-18 US claimed
US-20020045707-A1 Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom DOW GLOBAL TECHNOLOGIES INC. 2002-04-18 US claimed
US-20050165201-A1 Epoxidizing an alpha-halohydrin intermediate from a halide substitution-deesterification of an alpha -hydroxy ester derivative obtained by the coupling reaction of a phenol and a glycidyl ester BORIACK CLINTON J (US) 2005-07-28 US disclosed
US-20030149219-A1 Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom BORIACK CLINTON J (US) 2003-08-07 US disclosed
US-6534621-B2 Epoxidizing an alpha-halohydrin intermediate produced from an in situ halide substitution-deesterification of an alpha-hydroxy ester derivative DOW GLOBAL TECHNOLOGIES INC. 2003-03-18 US disclosed
US-20020045707-A1 Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom DOW GLOBAL TECHNOLOGIES INC. 2002-04-18 US disclosed