Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 known ✓ | P08172 | 1/20 | 0.47 |
| ▸ | CHRM1 known ✓ | P11229 | 1/20 | 0.47 |
| ▸ | ACHE known ✓ | P22303 | 1/20 | 0.47 |
| ▸ | SLC6A2 known ✓ | P23975 | 1/20 | 0.47 |
| ▸ | SLC6A3 known ✓ | Q01959 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 7/20 | 0.79 |
| ▸ | NPC1 | O15118 | 6/20 | 0.79 |
| ▸ | RAB9A | P51151 | 6/20 | 0.79 |
| ▸ | POLB | P06746 | 1/20 | 0.79 |
| ▸ | HTT | P42858 | 6/20 | 0.56 |
| ▸ | MEN1 | O00255 | 5/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.56 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.56 |
| ▸ | RAD52 | P43351 | 3/20 | 0.56 |
| ▸ | LMNA | P02545 | 2/20 | 0.56 |
| ▸ | RGS12 | O14924 | 1/20 | 0.56 |
| ▸ | USP2 | O75604 | 1/20 | 0.56 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL636714 | 1.00 | SMN1; SMN2 (0.79) | SMN1; SMN2NPC1RAB9APOLBHTT | |
| Hydrochloric Acid SCHEMBL444300 | 1.00 | SMN1; SMN2 (0.79) | SMN1; SMN2NPC1RAB9APOLBHTT | |
| Hydrochloric Acid SCHEMBL30980102 | 1.00 | SMN1; SMN2 (0.79) | SMN1; SMN2NPC1RAB9APOLBHTT | |
| Hydrochloric Acid SCHEMBL330337 | 1.00 | SMN1; SMN2 (0.79) | SMN1; SMN2NPC1RAB9APOLBHTT | |
| Hydrochloric Acid SCHEMBL330172 | 1.00 | SMN1; SMN2 (0.79) | SMN1; SMN2NPC1RAB9APOLBHTT | |
| Hydrochloric Acid SCHEMBL2530562 | 1.00 | SMN1; SMN2 (0.79) | SMN1; SMN2NPC1RAB9APOLBHTT | |
| SCHEMBL627771 | 0.98 | SMN1; SMN2 (0.81) | SMN1; SMN2NPC1RAB9APOLBHTT | |
| SCHEMBL4070988 | 0.98 | SMN1; SMN2 (0.81) | SMN1; SMN2NPC1RAB9APOLBHTT | |
| Hydrochloric Acid SCHEMBL9358066 | 0.98 | SMN1; SMN2 (0.75) | SMN1; SMN2NPC1RAB9APOLBHTT | |
| SCHEMBL627732 | 0.98 | SMN1; SMN2 (0.81) | SMN1; SMN2NPC1RAB9APOLBHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5135825-A | Complexing, controlling temperature | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1992-08-04 | — | — | US | claimed |
| EP-3898820-B1 | POLYMERIC COMPOSITIONS WITH HIGH DIELECTRIC CONSTANT AND LOW DIELECTRIC LOSS | CELANESE POLYMERS HOLDINGS INC (US) | 2025-05-28 | — | — | EP | disclosed |
| US-12247123-B2 | Polymeric compositions with high dielectric constant and low dielectric loss | CELANESE POLYMERS HOLDING, INC. (US) | 2025-03-11 | — | — | US | disclosed |
| WO-2024146848-A1 | CURABLE MATERIALS BASED ON CYCLIC THIOETHER COMPOUNDS, AND USES THEREOF | DELO INDUSTRIE KLEBSTOFFE GMBH & CO. KGAA (DE) | 2024-07-11 | — | — | WO | disclosed |
| CN-113614163-B | Polymer composition with high dielectric constant and low dielectric loss | 杜邦聚合物公司 | 2023-06-16 | — | — | CN | disclosed |
| CN-111320868-B | Polymer composition with high dielectric constant and low dielectric loss | 杜邦聚合物有限公司 | 2023-02-28 | — | — | CN | disclosed |
| US-20220056267-A1 | POLYMERIC COMPOSITIONS WITH HIGH DIELECTRIC CONSTANT AND LOW DIELECTRIC LOSS | CELANESE POLYMERS HOLDING, INC. | 2022-02-24 | — | — | US | disclosed |
| CN-113614163-A | Polymer composition with high dielectric constant and low dielectric loss | 杜邦聚合物公司 | 2021-11-05 | — | — | CN | disclosed |
| EP-3898820-A1 | POLYMERIC COMPOSITIONS WITH HIGH DIELECTRIC CONSTANT AND LOW DIELECTRIC LOSS | Dupont Polymers, Incorporated (US) | 2021-10-27 | — | — | EP | disclosed |
| WO-2020131212-A1 | POLYMERIC COMPOSITIONS WITH HIGH DIELECTRIC CONSTANT AND LOW DIELECTRIC LOSS | DUPONT POLYMERS, INCORPORATED (US) | 2020-06-25 | — | — | WO | disclosed |
| US-20040147708-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-07-29 | — | — | US | disclosed |
| US-20040122201-A1 | polysulfides; improved impact resistance | MITSUBISHI GAS CHEMICAL COMPANY (JP) | 2004-06-24 | — | — | US | disclosed |
| EP-1426392-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-06-09 | — | — | EP | disclosed |
| EP-1398317-A1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040026658-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL COMPANY INC. (JP) | 2004-02-12 | — | — | US | disclosed |
| US-20040024165-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-02-05 | — | — | US | disclosed |
| EP-1326095-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-07-09 | — | — | EP | disclosed |
| EP-1319966-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-18 | — | — | EP | disclosed |
| EP-1316819-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-04 | — | — | EP | disclosed |
| US-5135825-A | Complexing, controlling temperature | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1992-08-04 | — | — | US | disclosed |