⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iminobis(Methylphosphonic Acid) SCHEMBL357369 | 0.81 | KDM4E (0.44) | — | |
| SCHEMBL14356088 | 0.75 | KDM4E (0.39) | — | |
| SCHEMBL14357466 | 0.73 | — | — | |
| SCHEMBL6567116 | 0.71 | — | — | |
| SCHEMBL9572451 | 0.70 | PGK1 (0.36) | — | |
| SCHEMBL6567851 | 0.70 | — | — | |
| SCHEMBL20787656 | 0.69 | CYP1A2 (0.39) | — | |
| SCHEMBL19821633 | 0.69 | CA2 (0.37) | — | |
| SCHEMBL1463861 | 0.69 | — | — | |
| SCHEMBL8726608 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6884557-B2 | Desensitizing treatment liquid for lithographic printing | FUJI PHOTO FILM CO., LTD. (JP) | 2005-04-26 | — | — | US | disclosed |
| US-20030194623-A1 | Desensitizing treatment liquid for lithographic printing | FUJIFILM CORPORATION (JP) | 2003-10-16 | — | — | US | disclosed |
| US-5965660-A | POLYAMINES HAVING N-PHOSPHO- OR PHOSPHATO-METHYL GROUPS OR ADDITION POLYMERS HAVING THE SAME N-PENDANT GROUPS; POLLUTION CONTROL; STORAGE STABILITY; CONTINUOUS USE; REDUCED ETCHING TIME; ANTISOILANTS | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-12 | — | — | US | disclosed |
| US-5730787-A | HETEROCYCLIC AMINES WITH PHOSPHATE OR PHOSPHONATE GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 1998-03-24 | — | — | US | disclosed |