SCHEMBL6367201

SCHEMBL6367201

COCCCCCCCCS(=O)(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.46
APP P05067 1/20 0.42
EPHX2 P34913 1/20 0.36
LMNA P02545 4/20 0.35
BLM P54132 2/20 0.35
PTGS1 P23219 1/20 0.35
PDE4A P27815 1/20 0.35
SLC6A6 P31641 1/20 0.35
CYP2C19 P33261 1/20 0.35
KDM4E B2RXH2 2/20 0.33
ALOX15 P16050 2/20 0.33
TSHR P16473 2/20 0.33
POLB P06746 2/20 0.33
RAB9A P51151 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
USP2 O75604 1/20 0.33
MMP9 P14780 1/20 0.33
NPC1 O15118 1/20 0.33
MAPT P10636 1/20 0.33
BRCA1 P38398 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8372617 1.00 ALDH1A1 (0.46) ALDH1A1APPEPHX2LMNABLM
SCHEMBL3690659 1.00 ALDH1A1 (0.46) ALDH1A1APPEPHX2LMNABLM
SCHEMBL9446092 0.98 ALDH1A1 (0.45) ALDH1A1APPEPHX2LMNABLM
SCHEMBL864101 0.98 APP (0.44) ALDH1A1APPEPHX2LMNABLM
SCHEMBL3177040 0.90
Hydrochloric Acid SCHEMBL5063686 0.88 APP (0.44) ALDH1A1APPEPHX2LMNABLM
SCHEMBL10324781 0.88 APP (0.44) ALDH1A1APPEPHX2LMNABLM
SCHEMBL22800820 0.86 TSHR (0.40) ALDH1A1EPHX2LMNACYP2C19KDM4E
SCHEMBL22800817 0.86 TSHR (0.40) ALDH1A1EPHX2LMNACYP2C19KDM4E
SCHEMBL22800823 0.86 TSHR (0.40) ALDH1A1EPHX2LMNACYP2C19KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8173354-B2 Sulfonium salt, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-08 US disclosed
US-20110008735-A1 SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-01-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110008735-A1 SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS ETV6, ETV1, VPS4B ALDH1A1 4625/4885APP 4825/4885EPHX2 2756/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.