Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.48 |
| ▸ | HTT | P42858 | 2/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 4/20 | 0.39 |
| ▸ | NPC1 | O15118 | 3/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.39 |
| ▸ | GFER | P55789 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.35 |
| ▸ | BCL2 | P10415 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.32 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1263770 | 1.00 | SMN1; SMN2 (0.48) | SMN1; SMN2HTTMAPTCA12CA1 | |
| SCHEMBL30425848 | 1.00 | SMN1; SMN2 (0.48) | SMN1; SMN2HTTMAPTCA12CA1 | |
| Bromide SCHEMBL637005 | 0.98 | SMN1; SMN2 (0.47) | SMN1; SMN2HTTMAPTCA12CA1 | |
| SCHEMBL7262939 | 0.82 | CA12 (0.37) | SMN1; SMN2HTTMAPTCA12CA1 | |
| Hydrochloric Acid SCHEMBL28754080 | 0.73 | MAPT (0.38) | SMN1; SMN2HTTMAPTTSHRBCL2 | |
| Hydrochloric Acid SCHEMBL6702513 | 0.73 | SMN1; SMN2 (0.39) | SMN1; SMN2HTTMAPTCA12CA1 | |
| Hydrochloric Acid SCHEMBL10708206 | 0.73 | HDAC8 (0.40) | SMN1; SMN2HTTMAPTCA12CA1 | |
| SCHEMBL26186710 | 0.72 | CA12 (0.43) | SMN1; SMN2CA12CA1CA2CA9 | |
| SCHEMBL25530877 | 0.72 | CA12 (0.37) | SMN1; SMN2HTTMAPTCA12CA1 | |
| SCHEMBL26806792 | 0.71 | CA12 (0.46) | SMN1; SMN2CA12CA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8642718-B2 | Curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-04 | — | — | US | disclosed |
| EP-1882713-B1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2013-07-03 | — | — | EP | disclosed |
| US-8394920-B2 | Composition for resin and optical lens obtained therefrom | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-03-12 | — | — | US | disclosed |
| EP-1775315-B1 | POLYMERIZABLE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-02-22 | — | — | EP | disclosed |
| US-8013084-B2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2011-09-06 | — | — | US | disclosed |
| CN-101175792-B | Curable composition | MITSUBISHI GAS CHEMICAL CO | 2011-01-26 | — | — | CN | disclosed |
| EP-1398317-B1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2011-01-12 | — | — | EP | disclosed |
| US-20100331515-A1 | COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-12-30 | — | — | US | disclosed |
| EP-2243798-A1 | COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-1319966-B1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2010-05-26 | — | — | EP | disclosed |
| US-20040158031-A1 | Alicyclic compound for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-08-12 | — | — | US | disclosed |
| US-20040147708-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-07-29 | — | — | US | disclosed |
| US-20040122201-A1 | polysulfides; improved impact resistance | MITSUBISHI GAS CHEMICAL COMPANY (JP) | 2004-06-24 | — | — | US | disclosed |
| EP-1426392-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-06-09 | — | — | EP | disclosed |
| EP-1398317-A1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040026658-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL COMPANY INC. (JP) | 2004-02-12 | — | — | US | disclosed |
| US-20040024165-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-02-05 | — | — | US | disclosed |
| EP-1326095-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-07-09 | — | — | EP | disclosed |
| EP-1319966-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-18 | — | — | EP | disclosed |
| EP-1316819-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-04 | — | — | EP | disclosed |