SCHEMBL63713

SCHEMBL63713

C=C(C)C(=O)OC(C)O[Si](C)(OC(C)OC(=O)C(=C)C)OC(C)OC(=O)C(=C)C

nearest known ligand 0.41

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.41
ALDH1A1 P00352 2/20 0.39
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL322652 0.88 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL952948 0.88 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL2866951 0.86 TSHR (0.38) TSHRALDH1A1THRB
SCHEMBL65534 0.85 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL538063 0.82 TSHR (0.50) TSHRALDH1A1THRB
SCHEMBL4207433 0.81 TSHR (0.40) TSHRALDH1A1THRB
SCHEMBL2028634 0.81 TSHR (0.36) TSHRALDH1A1
SCHEMBL9559905 0.80 ALDH1A1 (0.41) TSHRALDH1A1
SCHEMBL9560048 0.80 ALDH1A1 (0.41) TSHRALDH1A1
SCHEMBL6904341 0.80 TSHR (0.48) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-60053514-A None JP disclosed
US-12319814-B2 Polyamideimide resin, resin composition, and semiconductor device RESONAC CORPORATION (JP) 2025-06-03 US disclosed
EP-4303250-A1 POLY(AMIDE-IMIDE) RESIN, RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE Resonac Corporation (JP) 2024-01-10 EP disclosed
EP-4026867-B1 POLYAMIDEIMIDE RESIN, RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE RESONAC CORP (JP) 2023-12-06 EP disclosed
EP-3730536-B1 POLYAMIDE IMIDE RESIN, POLYAMIDE IMIDE RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE USING POLYAMIDE IMIDE RESIN AND POLYAMIDE IMIDE RESIN COMPOSITION RESONAC CORP (JP) 2023-09-13 EP disclosed
US-20220332947-A1 POLYAMIDEIMIDE RESIN, RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE RESONAC CORPORATION (JP) 2022-10-20 US disclosed
WO-2022185718-A1 POLY(AMIDE-IMIDE) RESIN, RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE 昭和電工マテリアルズ株式会社 2022-09-09 WO disclosed
EP-4026867-A1 POLYAMIDE IMIDE RESIN, RESIN COMPOSITION AND SEMICONDUCTOR DEVICE Showa Denko Materials Co., Ltd. (JP) 2022-07-13 EP disclosed
EP-3730536-A1 POLYAMIDE IMIDE RESIN, POLYAMIDE IMIDE RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE USING POLYAMIDE IMIDE RESIN AND POLYAMIDE IMIDE RESIN COMPOSITION Hitachi Chemical Company, Ltd. (JP) 2020-10-28 EP disclosed
US-10808150-B2 Resin composition, method for manufacturing semiconductor device using resin composition, and solid-state imaging element HITACHI CHEMICAL COMPANY, LTD. (JP) 2020-10-20 US disclosed
US-6400492-B1 Electrophoretic display liquid, and electrophoretic display medium, method and device using the liquid RICOH COMPANY LIMITED (JP) 2002-06-04 US disclosed
US-20020032250-A1 Photocuring resin compositions, photocuring sheets and molded article using the same, and processes of production thereof MITSUBISHI RAYON CO., LTD. (JP) 2002-03-14 US disclosed
EP-1170109-A1 Photocuring resin compositions, photocuring sheets and molded article using the same and processes of production thereof Mitsubishi Rayon Co., Ltd. (JP) 2002-01-09 EP disclosed
US-6136886-A RUBBER KABUSHIKI KAISHA SHOFU (JP) 2000-10-24 US disclosed
US-6063830-A SILICA AND URETHANEACRYLATE KABUSHIKI KAISHA SHOFU (JP) 2000-05-16 US disclosed
EP-0534753-B1 Composite composition having high transparency and process for producing same MITSUBISHI RAYON CO (JP) 1996-12-18 EP disclosed
US-5385988-A A curable blends consisting of an additional polymer and a polysilicates, polysiloxanes or polysilsesquioxanes in a dispersion system of colloidal silica to form rigid, tough interpenetrating polymer networks MITSUBISHI RAYON CO., LTD. (JP) 1995-01-31 US disclosed
EP-0534753-A1 Composite composition having high transparency and process for producing same MITSUBISHI RAYON CO., LTD. (JP) 1993-03-31 EP disclosed
JP-S6053514-A RESIN COMPOSITION HITACHI CHEM CO LTD 1985-03-27 JP disclosed
JP-S0653514-A 0001-01-01 JP disclosed