SCHEMBL65534

SCHEMBL65534

C=C(C)C(=O)OC(C)O[Si](OC(C)OC(=O)C(=C)C)(OC(C)OC(=O)C(=C)C)OC(C)OC(=O)C(=C)C

nearest known ligand 0.42

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.42
ALDH1A1 P00352 1/20 0.41
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9559905 0.90 ALDH1A1 (0.41) TSHRALDH1A1
SCHEMBL9560048 0.90 ALDH1A1 (0.41) TSHRALDH1A1
SCHEMBL2028634 0.87 TSHR (0.36) TSHRALDH1A1
SCHEMBL27492219 0.85 TSHR (0.39) TSHRALDH1A1THRB
SCHEMBL322652 0.85 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL63713 0.85 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL952948 0.85 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL538063 0.84 TSHR (0.50) TSHRALDH1A1THRB
SCHEMBL6904341 0.81 TSHR (0.48) TSHRALDH1A1THRB
SCHEMBL8863646 0.80 TSHR (0.41) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-5255349-A None JP disclosed
US-20150299451-A1 Photocurable Resin Composition, Multilayer Sheet, Molded Multilayer Article, and Method for Producing Molded Multilayer Article MITSUBISHI RAYON CO., LTD. (JP) 2015-10-22 US disclosed
EP-2910583-A1 PHOTOCURABLE RESIN COMPOSITION, MULTILAYER SHEET, MOLDED MULTILAYER ARTICLE, AND METHOD FOR PRODUCING MOLDED MULTILAYER ARTICLE Mitsubishi Rayon Co., Ltd. (JP) 2015-08-26 EP disclosed
US-8137803-B2 Multilayer structure polymer and resin composition together with acrylic resin film material, acrylic resin laminate film, photocurable acrylic resin film or sheet, laminate film or sheet and laminate molding obtained by laminating thereof MITSUBISHI RAYON CO., LTD. (JP) 2012-03-20 US disclosed
US-8129443-B2 Inorganic oxide nanoparticles having an X-ray contrast property and high transparency, a functionalized silanediol monomeric or oligomeric surface modifier, and a polymerizable compound; dental composites SUN MEDICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-20100273019-A1 MULTILAYER STRUCTURE POLYMER AND RESIN COMPOSITION TOGETHER WITH ACRYLIC RESIN FILM MATERIAL, ACRYLIC RESIN LAMINATE FILM, PHOTOCURABLE ACRYLIC RESIN FILM OR SHEET, LAMINATE FILM OR SHEET AND LAMINATE MOLDING OBTAINED BY LAMINATING THEREOF MITSUBISHI RAYON CO., LTD. (JP) 2010-10-28 US disclosed
US-7781062-B2 Multilayer structure polymer and resin composition together with acrylic resin film material, acrylic resin laminate film, photocurable acrylic resin film or sheet, laminate film or sheet and laminate molding obtained by laminating thereof MITSUBISHI RAYON CO., LTD. (JP) 2010-08-24 US disclosed
EP-1582538-B1 MULTILAYER STRUCTURE POLYMER AND RESIN COMPOSITION TOGETHER WITH ACRYLIC RESIN FILM MATERIAL, ACRYLIC RESIN LAMINATE FILM, PHOTOCURABLE ACRYLIC RESIN FILM OR SHEET, LAMINATE FILM OR SHEET AND LAMINATE MOLDING OBTAINED BY LAMINATING THEREOF MITSUBISHI RAYON CO (JP) 2010-05-05 EP disclosed
US-20060110617-A1 Multilayer structure polymer and resin composition together with acrylic resin film material, acrylic resin laminate film, photocurable acrylic resin film or sheet, laminate film or sheet and laminate molding obtained by laminating thereof MITSUBISHI RAYON CO., LTD. (JP) 2006-05-25 US disclosed
EP-1582538-A1 MULTILAYER STRUCTURE POLYMER AND RESIN COMPOSITION TOGETHER WITH ACRYLIC RESIN FILM MATERIAL, ACRYLIC RESIN LAMINATE FILM, PHOTOCURABLE ACRYLIC RESIN FILM OR SHEET, LAMINATE FILM OR SHEET AND LAMINATE MOLDING OBTAINED BY LAMINATING THEREOF Mitsubishi Rayon Co., Ltd. (JP) 2005-10-05 EP disclosed
EP-1170109-A1 Photocuring resin compositions, photocuring sheets and molded article using the same and processes of production thereof Mitsubishi Rayon Co., Ltd. (JP) 2002-01-09 EP disclosed
US-6136874-A Microporous polymeric foams made with silicon or germanium based monomers THE PROCTER & GAMBLE COMPANY (US) 2000-10-24 US disclosed
US-6028127-A Artificial marble and method for preparing it MITSUBISHI RAYON CO., LTD. (JP) 2000-02-22 US disclosed
EP-0948560-A1 MICROPOROUS POLYMERIC FOAMS MADE WITH SILICON OR GERMANIUM BASED MONOMERS THE PROCTER & GAMBLE COMPANY (US) 1999-10-13 EP disclosed
WO-1998029486-A1 MICROPOROUS POLYMERIC FOAMS MADE WITH SILICON OR GERMANIUM BASED MONOMERS THE PROCTER & GAMBLE COMPANY (US) 1998-07-09 WO disclosed
EP-0786440-A1 ARTIFICIAL MARBLE AND PROCESS FOR PRODUCING THE SAME MITSUBISHI RAYON CO., LTD. (JP) 1997-07-30 EP disclosed
EP-0534753-B1 Composite composition having high transparency and process for producing same MITSUBISHI RAYON CO (JP) 1996-12-18 EP disclosed
US-5385988-A A curable blends consisting of an additional polymer and a polysilicates, polysiloxanes or polysilsesquioxanes in a dispersion system of colloidal silica to form rigid, tough interpenetrating polymer networks MITSUBISHI RAYON CO., LTD. (JP) 1995-01-31 US disclosed
JP-H05255349-A PRODUCTION OF REACTIVE ORGANOSILICON COMPOUND NIPPON SHOKUBAI CO LTD 1993-10-05 JP disclosed
EP-0534753-A1 Composite composition having high transparency and process for producing same MITSUBISHI RAYON CO., LTD. (JP) 1993-03-31 EP disclosed