SCHEMBL637360

SCHEMBL637360

Cc1ccccc1-n1cnc2c(=O)[nH]c(N)nc21

nearest known ligand 0.67

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
XDH P47989 9/20 0.67
MEN1 O00255 1/20 0.55
KMT2A Q03164 1/20 0.55
PI4KA P42356 1/20 0.54
PI4K2B Q8TCG2 1/20 0.54
PI4K2A Q9BTU6 1/20 0.54
PI4KB Q9UBF8 1/20 0.54
PNP P00491 5/20 0.53
HCAR1 Q9BXC0 1/20 0.48
DHFR P00374 1/20 0.44
TK1 P04183 1/20 0.44
USP2 O75604 1/20 0.43
TSHR P16473 1/20 0.43
EDNRA P25101 1/20 0.43
HTR2A P28223 1/20 0.43
RECQL P46063 1/20 0.43
BLM P54132 1/20 0.43
HBB P68871 1/20 0.43
HSD17B10 Q99714 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1286945 0.81 XDH (1.00) XDHMEN1KMT2API4KAPI4K2B
Hydrochloric Acid SCHEMBL21799342 0.80 XDH (0.97) XDHMEN1KMT2API4KAPI4K2B
SCHEMBL15741333 0.79 XDH (0.60) XDHMEN1KMT2APNPDHFR
SCHEMBL9434934 0.76 PNP (0.70) XDHPNPTK1USP2TSHR
SCHEMBL11610794 0.75 XDH (0.69) XDHMEN1KMT2APNPHCAR1
SCHEMBL1899765 0.74 XDH (0.64) XDHMEN1KMT2APNPTK1
SCHEMBL27881952 0.74 XDH (0.76) XDHMEN1KMT2API4KAPI4K2B
SCHEMBL3761457 0.73 XDH (1.00) XDHMEN1KMT2API4KAPI4K2B
SCHEMBL3310025 0.73 XDH (0.76) XDHMEN1KMT2APNPDHFR
SCHEMBL28141593 0.73 PI4KA (0.50) XDHMEN1KMT2API4KAPI4K2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118203522-A Sugar-resistant, oxidation-resistant and aging-resistant compound and preparation method and application thereof 上海肤徕生物高科技有限公司 2024-06-18 CN claimed
CN-118203522-A Sugar-resistant, oxidation-resistant and aging-resistant compound and preparation method and application thereof 上海肤徕生物高科技有限公司 2024-06-18 CN disclosed
EP-2990438-B1 NITRILE RUBBER COMPOSITION, CROSSLINKABLE RUBBER COMPOSITION, AND CROSSLINKED RUBBER PRODUCT ZEON CORP (JP) 2020-04-01 EP disclosed
US-20160090464-A1 NITRILE RUBBER COMPOSITION, CROSS-LINKABLE RUBBER COMPOSITION, AND CROSS-LINKED RUBBER ZEON CORPORATION (JP) 2016-03-31 US disclosed
EP-2990438-A1 NITRILE RUBBER COMPOSITION, CROSSLINKABLE RUBBER COMPOSITION, AND CROSSLINKED RUBBER PRODUCT Zeon Corporation (JP) 2016-03-02 EP disclosed
US-8642718-B2 Curable composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-02-04 US disclosed
EP-1882713-B1 CURABLE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2013-07-03 EP disclosed
EP-1775315-B1 POLYMERIZABLE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2012-02-22 EP disclosed
CN-101175792-B Curable composition MITSUBISHI GAS CHEMICAL CO 2011-01-26 CN disclosed
EP-1398317-B1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2011-01-12 EP disclosed
US-7091307-B2 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-08-15 US disclosed
US-6960640-B2 Composition for optical material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2005-11-01 US disclosed
US-20040158031-A1 Alicyclic compound for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2004-08-12 US disclosed
US-20040147708-A1 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-07-29 US disclosed
US-20040122201-A1 polysulfides; improved impact resistance MITSUBISHI GAS CHEMICAL COMPANY (JP) 2004-06-24 US disclosed
EP-1426392-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-06-09 EP disclosed
EP-1398317-A1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-03-17 EP disclosed
EP-1326095-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-07-09 EP disclosed
EP-1319966-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-18 EP disclosed
US-4877817-A BLEND WITH A MERCAPTOTRIAZINE COMPOUND MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1989-10-31 US disclosed