SCHEMBL6396307

SCHEMBL6396307

CCCCCCl.CCc1cccc(C=CC(=O)c2ccccc2)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAOB P27338 4/20 0.53
▸ BCHE P06276 7/20 0.50
▸ MAPT P10636 4/20 0.49
▸ ACHE P22303 3/20 0.49
▸ PLIN1 O60240 1/20 0.49
▸ LMNA P02545 1/20 0.49
▸ TNFRSF1A P19438 1/20 0.49
▸ RECQL P46063 1/20 0.49
▸ PLIN5 Q00G26 1/20 0.49
▸ CYP1B1 Q16678 1/20 0.49
▸ ABHD5 Q8WTS1 1/20 0.49
▸ TUBB4A P04350 2/20 0.48
▸ TUBB P07437 2/20 0.48
▸ TUBA3C P0DPH7 2/20 0.48
▸ TUBA1B P68363 2/20 0.48
▸ TUBA4A P68366 2/20 0.48
▸ TUBB4B P68371 2/20 0.48
▸ TUBB3 Q13509 2/20 0.48
▸ TUBB2A Q13885 2/20 0.48
▸ TUBB8 Q3ZCM7 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21457504 0.89 MAPT (0.62) MAOBBCHEMAPTACHEPLIN1
SCHEMBL21457502 0.89 MAPT (0.62) MAOBBCHEMAPTACHEPLIN1
Chalcone SCHEMBL6392672 0.87 BCHE (0.65) MAOBBCHEMAPTACHEPLIN1
Chalcone SCHEMBL6392677 0.87 BCHE (0.65) MAOBBCHEMAPTACHEPLIN1
SCHEMBL27606021 0.86 MAOB (0.57) MAOBBCHEMAPTACHEPLIN1
4-Chloro Chalcone SCHEMBL6399394 0.80 MAOB (0.71) MAOBBCHEMAPTACHEPLIN1
SCHEMBL27588183 0.80 MAPT (0.71) MAOBBCHEMAPTACHEPLIN1
4-Chloro Chalcone SCHEMBL6399398 0.80 MAOB (0.71) MAOBBCHEMAPTACHEPLIN1
SCHEMBL10498147 0.78 P4HB (0.47) MAOBBCHEACHETUBB4ATUBB
SCHEMBL10498161 0.78 P4HB (0.47) MAOBBCHEACHETUBB4ATUBB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050014928-A1 Epoxy resin polymer and alignment film materials containing same for liquid crystal display ETERNAL CHEMICAL CO., LTD. (TW) 2005-01-20 — — US claimed
US-6849377-B2 Photoresists, polymers and processes for microlithography E. I. DU PONT DE NEMOURS AND COMPANY (US) 2005-02-01 — — US disclosed
US-20050014928-A1 Epoxy resin polymer and alignment film materials containing same for liquid crystal display ETERNAL CHEMICAL CO., LTD. (TW) 2005-01-20 — — US disclosed
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