Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 13/20 | 0.40 |
| ▸ | CA2 | P00918 | 13/20 | 0.40 |
| ▸ | MMP1 | P03956 | 5/20 | 0.40 |
| ▸ | MMP2 | P08253 | 5/20 | 0.40 |
| ▸ | MMP9 | P14780 | 5/20 | 0.40 |
| ▸ | MMP8 | P22894 | 5/20 | 0.40 |
| ▸ | MMP13 | P45452 | 5/20 | 0.40 |
| ▸ | ESR1 | P03372 | 2/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL1816739 | 0.82 | PTPN1 (0.47) | CA1CA2MMP1MMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL28873878 | 0.81 | CYP3A4 (0.52) | CYP3A4TDP1CA1CA2ESR1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1673260 | 0.81 | CYP3A4 (0.52) | CYP3A4TDP1CA1CA2ESR1 | |
| Trifluoromethanesulfonic Acid SCHEMBL28873880 | 0.81 | CYP3A4 (0.52) | CYP3A4TDP1CA1CA2ESR1 | |
| Trifluoromethanesulfonic Acid SCHEMBL30238285 | 0.81 | CYP3A4 (0.52) | CYP3A4TDP1CA1CA2ESR1 | |
| SCHEMBL21518335 | 0.81 | RORA (0.43) | CYP3A4CA1CA2MMP1MMP2 | |
| Iodobenzene SCHEMBL5315922 | 0.81 | CA2 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL13836717 | 0.81 | TSHR (0.57) | CA1CA2MMP1MMP2MMP9 | |
| Benzenethiol SCHEMBL29745974 | 0.81 | CA2 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL31621707 | 0.80 | CYP3A4 (0.50) | CYP3A4TDP1CA1CA2ESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6846895-B2 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-25 | — | — | US | disclosed |
| EP-1142928-B1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR CORP (JP) | 2004-02-18 | — | — | EP | disclosed |
| US-20030191268-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition | IWASAWA HARUO (JP) | 2003-10-09 | — | — | US | disclosed |
| US-6531260-B2 | Photoresist | JSR CORPORATION (JP) | 2003-03-11 | — | — | US | disclosed |
| US-20010041769-A1 | Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1142928-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR Corporation (JP) | 2001-10-10 | — | — | EP | disclosed |