Known targets — ChEMBL curated mechanism
BTKCACNA1CCACNA1DCACNA1FCACNA1SCACNA2D1CACNA2D2DRD2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQHRH1HTR2AP2RY12
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.57 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.57 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 13/20 | 0.40 |
| ▸ | CA2 | P00918 | 13/20 | 0.40 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
| ▸ | MMP1 | P03956 | 3/20 | 0.39 |
| ▸ | MMP2 | P08253 | 3/20 | 0.39 |
| ▸ | MMP9 | P14780 | 3/20 | 0.39 |
| ▸ | MMP8 | P22894 | 3/20 | 0.39 |
| ▸ | MMP13 | P45452 | 3/20 | 0.39 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.38 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL1816739 | 0.84 | PTPN1 (0.47) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL28452983 | 0.82 | TSHR (0.57) | TSHRSMN1; SMN2POLBCYP2D6CA1 | |
| Iodobenzene SCHEMBL5315922 | 0.82 | CA2 (0.39) | CA1CA2NR1H3MMP1MMP2 | |
| Benzenethiol SCHEMBL29745974 | 0.82 | CA2 (0.39) | TSHRSMN1; SMN2CA1CA2NR1H3 | |
| SCHEMBL1362601 | 0.81 | CA2 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| Diphenylsulfane SCHEMBL29961389 | 0.81 | CA2 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1360857 | 0.81 | CA2 (0.38) | CA1CA2NR1H3MMP1MMP2 | |
| SCHEMBL6396331 | 0.81 | CYP3A4 (0.41) | CA1CA2HSD11B1MMP1MMP2 | |
| SCHEMBL547720 | 0.81 | CA2 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL2701591 | 0.81 | TSHR (0.73) | TSHRSMN1; SMN2POLBCYP2D6CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9606435-B2 | Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20140356790-A1 | METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE SACRIFICIAL FILM-FORMING COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2014-12-04 | — | — | US | disclosed |
| EP-2533099-B1 | Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition | SHINETSU CHEMICAL CO (JP) | 2014-10-29 | — | — | EP | disclosed |
| US-8835091-B2 | Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-20120328985-A1 | Fluorine-Containing Sulfonate Resin, Fluorine-Containing N-Sulfonyloxyimide Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-12-27 | — | — | US | disclosed |
| EP-2533099-A2 | Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-12-12 | — | — | EP | disclosed |
| US-20120292286-A1 | METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE SACRIFICIAL FILM-FORMING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120328985-A1 | Fluorine-Containing Sulfonate Resin, Fluorine-Containing N-Sulfonyloxyimide Resin, Resist Composition and Pattern Formation Method | RTRAF, EIF3F, RER1 | TSHR 1369/4885SMN1; SMN2 792/4885POLB 2939/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.