SCHEMBL6396994

SCHEMBL6396994

C=CCOC(=O)CC(=O)O[Si](CC=C)(CC=C)CC=C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.40
MAPT P10636 1/20 0.40
CACNA1B Q00975 1/20 0.40
APBA1 Q02410 1/20 0.40
TDP1 Q9NUW8 1/20 0.37
ALDH1A1 P00352 4/20 0.35
GAA P10253 2/20 0.35
CYP3A4 P08684 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
PKM P14618 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
MGAM O43451 1/20 0.31
SI P14410 1/20 0.31
MGAM2 Q2M2H8 1/20 0.31
EPHX2 P34913 1/20 0.31
HSD17B10 Q99714 2/20 0.31
KDM4E B2RXH2 1/20 0.31
TP53 P04637 1/20 0.31
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4563189 0.88 ALDH1A1 (0.32) MAPTCACNA1BAPBA1ALDH1A1
SCHEMBL57069 0.82 TSHR (0.52) TSHRMAPTCACNA1BAPBA1TDP1
Lithium SCHEMBL31366079 0.80 TSHR (0.50) TSHRMAPTCACNA1BAPBA1TDP1
SCHEMBL8865453 0.80 TSHR (0.50) TSHRMAPTCACNA1BAPBA1TDP1
SCHEMBL2320799 0.76 TSHR (0.57) TSHRMAPTCACNA1BAPBA1TDP1
Butane SCHEMBL284262 0.74 TSHR (0.60) TSHRMAPTCACNA1BAPBA1TDP1
SCHEMBL4563085 0.74 MAPT (0.50) TSHRMAPTCACNA1BAPBA1TDP1
SCHEMBL527458 0.74 TSHR (0.50) TSHRMAPTCACNA1BAPBA1TDP1
SCHEMBL4767550 0.73 TSHR (0.48) TSHRMAPTCACNA1BAPBA1TDP1
SCHEMBL11782914 0.73 TSHR (0.46) TSHRMAPTCACNA1BAPBA1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1142894-B1 Volatile precursors for deposition of metals and metal-containing films AIR PROD & CHEM (US) 2005-01-12 EP disclosed
US-6818783-B2 HOMOLOGOUS EIGHT MEMBERED RING COMPOUNDS HAVING A METAL, SUCH AS COPPER, REVERSIBLY BOUND IN THE RING AND CONTAINING CARBON, NITROGEN, SILICON AND/OR OTHER METALS. AIR PRODUCTS AND CHEMICALS, INC. 2004-11-16 US disclosed
US-20040215030-A1 Precursors for metal containing films VERSUM MATERIALS US, LLC 2004-10-28 US disclosed
EP-1471568-A1 Precursors for metal containing films AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-10-27 EP disclosed
US-20030135061-A1 Volatile precursors for deposition of metals and metal-containing films VERSUM MATERIALS US, LLC 2003-07-17 US disclosed
US-20020013487-A1 Volatile precursors for deposition of metals and metal-containing films VERSUM MATERIALS US, LLC 2002-01-31 US disclosed
EP-1142894-A2 Volatile precursors for deposition of metals and metal-containing films AIR PRODUCTS AND CHEMICALS, INC. (US) 2001-10-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020013487-A1 Volatile precursors for deposition of metals and metal-containing films SOD1, C1R, C5 TSHR 3274/4885MAPT 1670/4885CACNA1B 431/4885
US-20030135061-A1 Volatile precursors for deposition of metals and metal-containing films SOD1, C1R, C5 TSHR 3302/4885MAPT 1833/4885CACNA1B 555/4885
US-20040215030-A1 Precursors for metal containing films TBL3, TBL2, TNNI3 TSHR 2197/4885MAPT 880/4885CACNA1B 110/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.