Aziridine

Aziridine

SCHEMBL64046

C1CN1.CCO

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

MMP1MMP13MMP7MMP8polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Aziridine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Piperazine SCHEMBL9506704 0.96 ALDH1A1 (0.50)
Piperazine SCHEMBL1485419 0.96
Aziridine SCHEMBL27979623 0.92
Piperazine SCHEMBL28015400 0.92 ALDH1A1 (0.46)
Piperazine SCHEMBL22092466 0.92 ALDH1A1 (0.46)
Piperazine SCHEMBL29044668 0.92 ALDH1A1 (0.46)
Cyclohexane SCHEMBL28639868 0.89 ALDH1A1 (0.44)
Pyrrolidine SCHEMBL5683314 0.89 ALDH1A1 (0.53)
Pyrrolidine SCHEMBL222328 0.89
Azetidine SCHEMBL1500479 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1088 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119799083-A Paint for preventing oxidation passivation of steel surface and preparation method and application thereof 陕西中涂联涂料科技有限公司 2025-04-11 CN claimed
CN-118304852-A Preparation and application of carbon-nitrogen co-doped zinc oxide nanocomposite 兰州理工大学 2024-07-09 CN claimed
CN-118179603-A Composite material for degrading dye as well as preparation method and application thereof 山东太阳纸业股份有限公司 2024-06-14 CN claimed
US-20240182683-A1 STABILIZER COMPOSITION, USE OF THE STABILIZER COMPOSITION, METHOD FOR STABILIZING CONDENSATION POLYMERS AGAINST HYDROLYTIC DEGRADATION, AND HYDROLYSIS-STABILIZED COMPOSITION AND MOLDING OR MOLDED PART CONSISTING THEREOF Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 2024-06-06 US claimed
CN-115650229-B Production process of active carbon rod in water treatment device 亳州市亚珠新材料有限公司 2024-05-03 CN claimed
CN-115644182-B Chiral nano antibacterial material with autofluorescence/pH double response and preparation method and application thereof 南京农业大学 2024-04-02 CN claimed
CN-117283185-A High-stability lead-free solder paste without inner cover and preparation method thereof 深圳市宇航金属新材料有限公司 2023-12-26 CN claimed
CN-114261963-B Preparation method of functionalized graphite flake compound 陕西师范大学 2023-08-11 CN claimed
CN-116554469-A Phosphorus-sulfur synergistic macromolecular flame retardant, preparation method thereof and application thereof in polylactic acid material 扬州惠通生物新材料有限公司 2023-08-08 CN claimed
CN-116288743-A Oligonucleotide ink-jet printing method 北京铭毅智造科技有限公司 2023-06-23 CN claimed
US-7727707-B2 Barrier film material and pattern formation method using the same PANASONIC CORPORATION (JP) 2010-06-01 US claimed
CN-1285100-C Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2006-11-15 CN claimed
US-20060127812-A1 Barrier film material and pattern formation method using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2006-06-15 US claimed
EP-1669804-A2 Barrier film material and pattern formation method using the same Matsushita Electric Industries Co., Ltd. (JP) 2006-06-14 EP claimed
CN-1786820-A Barrier film material and pattern formation method using the same MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2006-06-14 CN claimed
US-6872787-B2 Post-treatment of a polymeric composition ISP INVESTMENTS INC. (US) 2005-03-29 US claimed
CN-1574218-A Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2005-02-02 CN claimed
WO-2002012185-A1 PROCESS FOR PREPARING 2,3-DIAMINOPROPANOLS AND SYNTHESIS OF OTHER COMPOUNDS USING 2,3-DIAMINOPROPANOLS CHEMBIONEX CO., LTD. (KR) 2002-02-14 WO claimed
US-5712331-A Curable epoxy compositions containing aziridine in supercritical fluid carbon dioxide ROCKWELL INTERNATIONAL CORPORATION (US) 1998-01-27 US claimed
EP-0758662-A2 Curable epoxy compositions containing aziridine ROCKWELL INTERNATIONAL CORPORATION (US) 1997-02-19 EP claimed