SCHEMBL6413199

SCHEMBL6413199

Oc1[c]c2c3c(cccc3c1)-c1ccccc1-2

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.45
MAPK1 P28482 5/20 0.45
HSD17B10 Q99714 5/20 0.45
TSHR P16473 3/20 0.45
L3MBTL1 Q9Y468 3/20 0.45
ATM Q13315 2/20 0.45
CASP1 P29466 3/20 0.41
HPGD P15428 3/20 0.41
CASP7 P55210 3/20 0.41
HIF1A Q16665 2/20 0.41
TP53 P04637 2/20 0.41
KLK7 P49862 1/20 0.38
PABPC1 P11940 3/20 0.37
DNMT1 P26358 2/20 0.37
CYP3A4 P08684 2/20 0.37
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
MCL1 Q07820 2/20 0.35
CACNA1B Q00975 1/20 0.35
APBA1 Q02410 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18317628 0.78 MAPK1 (0.45) ALDH1A1MAPK1HSD17B10TSHRL3MBTL1
SCHEMBL18317228 0.78 MAPK1 (0.45) ALDH1A1MAPK1HSD17B10TSHRL3MBTL1
SCHEMBL2995194 0.75 KLK7 (0.47) ALDH1A1MAPK1HSD17B10TSHRL3MBTL1
SCHEMBL6417159 0.74 MAPK1 (0.41) ALDH1A1MAPK1HSD17B10TSHRL3MBTL1
SCHEMBL6413188 0.71 ALDH1A1 (0.38) ALDH1A1MAPK1HSD17B10TSHRL3MBTL1
SCHEMBL18317441 0.70 BCHE (0.40) ALDH1A1MAPK1HSD17B10TSHRL3MBTL1
SCHEMBL18317640 0.69 KDM4E (0.41) ALDH1A1MAPK1HSD17B10TSHRL3MBTL1
SCHEMBL18317172 0.68 RAB9A (0.37) ALDH1A1MAPK1HSD17B10TSHRL3MBTL1
SCHEMBL26787 0.67 ALDH1A1 (0.56) ALDH1A1MAPK1HSD17B10TSHRL3MBTL1
SCHEMBL22159745 0.67 CRHBP (0.37) ALDH1A1MAPK1HSD17B10TSHRL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110713588-B Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2022-08-09 CN claimed
US-11214678-B2 Hardmask composition, hardmask layer and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2022-01-04 US claimed
CN-110713588-A Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2020-01-21 CN claimed
CN-110713588-B Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2022-08-09 CN disclosed
US-11220570-B2 Polymer, hardmask composition, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2022-01-11 US disclosed
US-11214678-B2 Hardmask composition, hardmask layer and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2022-01-04 US disclosed
CN-111378084-A Polymer and hardmask composition and method of forming a pattern 三星SDI株式会社 2020-07-07 CN disclosed
US-20200207902-A1 POLYMER, HARDMASK COMPOSITION, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2020-07-02 US disclosed
CN-111352300-A Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2020-06-30 CN disclosed
US-20200201185-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2020-06-25 US disclosed
CN-110713588-A Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2020-01-21 CN disclosed
EP-1180765-B1 Optical recording medium and porphycene compound MITSUI CHEMICALS INC (JP) 2005-04-06 EP disclosed
EP-1180765-A1 Optical recording medium and porphycene compound Mitsui Chemicals, Inc. (JP) 2002-02-20 EP disclosed