SCHEMBL641967

SCHEMBL641967

OC1(C2CCCC2)CCCC1

nearest known ligand 0.40

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.40
OPRM1 P35372 2/20 0.40
OPRK1 P41145 2/20 0.40
OPRL1 P41146 2/20 0.40
MAPT P10636 2/20 0.40
LMNA P02545 1/20 0.40
OPRD1 P41143 1/20 0.40
HSD17B10 Q99714 1/20 0.38
ATM Q13315 1/20 0.37
MET P08581 1/20 0.36
MAPK1 P28482 2/20 0.33
TRPA1 O75762 1/20 0.32
KDM4E B2RXH2 1/20 0.31
ALDH1A1 P00352 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9891 1.00 TSHR (0.40) TSHROPRM1OPRK1OPRL1MAPT
SCHEMBL4613762 1.00 TSHR (0.40) TSHROPRM1OPRK1OPRL1MAPT
SCHEMBL4964887 0.97 OPRM1 (0.43) TSHROPRM1OPRK1OPRL1MAPT
SCHEMBL7359458 0.97 OPRM1 (0.43) TSHROPRM1OPRK1OPRL1MAPT
SCHEMBL7924907 0.97 OPRM1 (0.39) TSHROPRM1OPRK1OPRL1MAPT
SCHEMBL5081429 0.97 OPRM1 (0.43) TSHROPRM1OPRK1OPRL1MAPT
SCHEMBL7572979 0.97 OPRM1 (0.43) TSHROPRM1OPRK1OPRL1MAPT
SCHEMBL3711846 0.97 OPRM1 (0.43) TSHROPRM1OPRK1OPRL1MAPT
SCHEMBL3708728 0.97 OPRM1 (0.43) TSHROPRM1OPRK1OPRL1MAPT
SCHEMBL541617 0.97 OPRM1 (0.43) TSHROPRM1OPRK1OPRL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023160806-A1 2-CYCLOPENTYLCYCLOPENTANOL AS A FRAGRANCE SYMRISE AG (DE) 2023-08-31 WO disclosed
US-20210017415-A1 One Component UV Curable Compositions And Methods For Making Same DVORCHAK ENTERPRISES LLC (US) 2021-01-21 US disclosed
WO-2020131185-A2 ONE COMPONENT UV CURABLE COMPOSITIONS AND METHODS FOR MAKING SAME DVORCHAK ENTERPRISES LLC (US) 2020-06-25 WO disclosed
US-10100223-B2 Methods for making elastomers, elastomer compositions and related elastomers ALLNEX NETHERLANDS B.V. (NL) 2018-10-16 US disclosed
EP-2665787-B1 NON-AQUEOUS POLYURETHANE COATING COMPOSITIONS ALLNEX NETHERLANDS BV (NL) 2018-08-22 EP disclosed
US-9988485-B2 Process for preparing low-viscosity allophanates containing actinically curable groups ALLNEX NETHERLANDS B.V. (NL) 2018-06-05 US disclosed
US-20160122463-A1 Process for preparing low-viscosity allophanates containing actinically curable groups ALLNEX NETHERLANDS B.V. (NL) 2016-05-05 US disclosed
US-9255067-B2 Process for preparing low-viscosity allophanates containing actinically curable groups Allnex IP S.ar.L. (LU) 2016-02-09 US disclosed
US-20160002497-A1 METHODS FOR MAKING ELASTOMERS, ELASTOMER COMPOSITIONS AND RELATED ELASTOMERS ALLNEX NETHERLANDS B.V. (NL) 2016-01-07 US disclosed
US-9034472-B2 Non-aqueous polyurethane coating compositions ALLNEX IP S.A.R.L. (LU) 2015-05-19 US disclosed
US-20110008727-A1 Low Activation Energy Photoresist Composition and Process for Its Use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-01-13 US disclosed
US-20100304295-A1 ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-02 US disclosed
US-20100304295-A1 ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-02 US disclosed
US-20090197092-A1 Dual-cure coating compositions based on polyaspartates polyisocyanates and acrylate-containing compounds BAYER MATERIALSCIENCE LLC 2009-08-06 US disclosed
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed
US-20090137750-A1 Process for preparing low-viscosity allophanates containing actinically curable groups ALLNEX NETHERLANDS B.V. (NL) 2009-05-28 US disclosed
US-7476492-B2 Low activation energy photoresist composition and process for its use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-01-13 US disclosed
US-20070275324-A1 Low activation energy photoresist composition and process for its use GLOBALFOUNDRIES U.S. INC. 2007-11-29 US disclosed
US-20060079660-A1 Process for preparing low-viscosity allophanates containing actinically curable groups BAYER MATERIALSCIENCE AG 2006-04-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100304295-A1 ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS COASY, DHCR24, HCAR1 TSHR 1968/4885OPRM1 852/4885OPRK1 1382/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.