SCHEMBL642729

SCHEMBL642729

CCOC(C)(C)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12230934 0.80 CYP4F2 (0.33)
SCHEMBL28457116 0.80 ALDH1A1 (0.36)
SCHEMBL22609458 0.79 LMNA (0.38)
SCHEMBL11131620 0.78
SCHEMBL15116489 0.78
SCHEMBL26380 0.78 ALDH1A1 (0.38)
SCHEMBL5947966 0.78 ALDH1A1 (0.38)
SCHEMBL21812161 0.77 GAA (0.44)
SCHEMBL14509111 0.76 SOAT1 (0.36)
SCHEMBL4676137 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 652 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4616684-A1 LIQUID CRYSTALLINE SAM VIA SPIN-COAT ASSEMBLY AND THEIR AREA SELECTIVE DEPOSITION PROPERTIES Merck Patent GmbH (DE) 2025-09-17 EP claimed
WO-2024100183-A1 LIQUID CRYSTALLINE SAM VIA SPIN-COAT ASSEMBLY AND THEIR AREA SELECTIVE DEPOSITION PROPERTIES MERCK PATENT GMBH (DE) 2024-05-16 WO claimed
CN-115746616-A Surface-modified hollow silica particles and surface-modified hollow silica dispersion 凯斯科技股份有限公司 2023-03-07 CN claimed
US-10233337-B2 Charge-transporting varnish NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-03-19 US claimed
US-10155879-B2 Compositions and use thereof for modification of substrate surfaces AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2018-12-18 US claimed
EP-2822050-B1 CHARGE-TRANSPORTING VARNISH NISSAN CHEMICAL IND LTD (JP) 2017-06-14 EP claimed
US-20150053892-A1 CHARGE-TRANSPORTING VARNISH NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-02-26 US claimed
EP-2822050-A1 CHARGE-TRANSPORTING VARNISH Nissan Chemical Industries, Ltd. (JP) 2015-01-07 EP claimed
EP-1957552-B1 THERMOSETTING RESIN COMPOSITION, THERMOSETTING RESIN COMPOSITION SOLUTION, FILM FORMING MATERIAL AND THEIR CURED PRODUCT SHOWA DENKO KK (JP) 2011-10-19 EP claimed
EP-1937737-B1 CARBOXYL GROUP-CONTAINING POLYURETHANE AND HEAT-CURABLE POLYURETHANE RESIN COMPOSITION PREPARED THEREFROM SHOWA DENKO KK (JP) 2011-04-27 EP claimed
EP-1899396-B1 CARBOXYL GROUP-CONTAINING POLYURETHANE AND USES THEREOF SHOWA DENKO KK (JP) 2010-12-22 EP claimed
US-7314703-B2 Chemically amplified resist material and pattern formation method using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2008-01-01 US claimed
EP-1734407-A2 Chemically amplified resist material and pattern formation method using the same Matsushita Electric Industrial Co., Ltd. (JP) 2006-12-20 EP claimed
US-20060281025-A1 Chemically amplified resist material and pattern formation method using the same BARINGS FINANCE LLC, AS COLLATERAL AGENT 2006-12-14 US claimed
EP-1016698-B1 Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks MITSUBISHI RAYON CO (JP) 2004-09-22 EP claimed
EP-0948553-B1 FRACTIONATED NOVOLAK RESIN FROM CRESOL-FORMALDEHYDE REACTION MIXTURE AND PHOTORESIST COMPOSITION THEREFROM CLARIANT FINANCE BVI LTD (VG) 2001-04-11 EP claimed
EP-0211667-B1 RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-03-11 EP claimed
JP-8283793-A None JP disclosed
EP-0609058-A2 Hexahydronaphthalene ester derivatives, their preparation and their therapeutic uses SANKYO COMPANY LIMITED (JP) 1994-08-03 EP disclosed
US-4347379-A REACTING AN ALCOHOL OF THIOL, A HALOFORM, ALKALI METAL HYDROXIDE, AND PHASE TRANSFER AGENT THE B. F. GOODRICH COMPANY (US) 1982-08-31 US disclosed