SCHEMBL642799

SCHEMBL642799

CCCCCC(C)C(C)(O)O.CCCCCC(C)C(C)(O)O.CCCCCC(C)C(C)(O)O.CCCCCC(C)C(C)(O)O.[Zr]

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.42
CA1 P00915 2/20 0.40
SPHK1 Q9NYA1 1/20 0.40
FDPS P14324 5/20 0.39
LMNA P02545 1/20 0.39
TP53 P04637 1/20 0.39
ADH1B P00325 1/20 0.38
ADH1C P00326 1/20 0.38
ADH1A P07327 1/20 0.38
ADH4 P08319 1/20 0.38
ADH7 P40394 1/20 0.38
CA2 P00918 1/20 0.38
ACE2 Q9BYF1 1/20 0.36
GPR84 Q9NQS5 3/20 0.35
FFAR1 O14842 1/20 0.35
MAPT P10636 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27883325 0.98 OPRM1 (0.44) OPRM1CA1SPHK1FDPSLMNA
SCHEMBL1848255 0.95 SPHK1 (0.45) OPRM1CA1SPHK1FDPSLMNA
SCHEMBL6336439 0.95 SPHK1 (0.45) OPRM1CA1SPHK1FDPSLMNA
SCHEMBL28945249 0.95 SPHK1 (0.45) OPRM1CA1SPHK1FDPSLMNA
SCHEMBL947646 0.95 SPHK1 (0.45) OPRM1CA1SPHK1FDPSLMNA
SCHEMBL9328960 0.93 SPHK1 (0.43) OPRM1CA1SPHK1FDPSLMNA
SCHEMBL568424 0.90 CA2 (0.39) OPRM1CA1FDPSCA2
SCHEMBL1877951 0.83 OPRM1 (0.44) OPRM1CA1SPHK1FDPSLMNA
Ammonia Solution, Strong SCHEMBL8463678 0.81 DNM1 (0.52) SPHK1FDPSLMNAADH1BADH1C
SCHEMBL61071 0.81 SPHK1 (0.45) OPRM1CA1SPHK1FDPSLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120107965-A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME FUJITSU SEMICONDUCTOR LIMITED (JP) 2012-05-03 US disclosed
US-8120087-B2 Ferroelectric capacitor with underlying conductive film FUJITSU SEMICONDUCTOR LIMITED (JP) 2012-02-21 US disclosed
US-20100001325-A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME FUJITSU MICROELECTRONICS LIMITED (JP) 2010-01-07 US disclosed