SCHEMBL6429677

SCHEMBL6429677

C=C(C)COCCC[SiH2]OC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17743496 0.81 CES2 (0.31)
SCHEMBL345836 0.79 CES2 (0.31)
SCHEMBL3363123 0.76 CES2 (0.32)
SCHEMBL8766930 0.76 CES2 (0.34)
SCHEMBL2684216 0.75
SCHEMBL1936164 0.75 CES2 (0.32)
SCHEMBL10454763 0.74 CES2 (0.31)
SCHEMBL871697 0.73 CES2 (0.44)
SCHEMBL7256155 0.73 CES2 (0.39)
SCHEMBL3349582 0.73 CES2 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1166181-B1 PHOTOSENSITIVE PASTES AND SUBSTRATES FOR PLASMA DISPLAY PANEL USING THE SAME MINNESOTA MINING & MFG (US) 2005-07-13 EP disclosed
US-6537645-B1 Photosensitive pastes and substrates for plasma display panel using the same 3M INNOVATIVE PROPERTIES COMPANY 2003-03-25 US disclosed
EP-1166181-A1 PHOTOSENSITIVE PASTES AND SUBSTRATES FOR PLASMA DISPLAY PANEL USING THE SAME MINNESOTA MINING AND MANUFACTURING COMPANY (US) 2002-01-02 EP disclosed
WO-2000050958-A1 PHOTOSENSITIVE PASTES AND SUBSTRATES FOR PLASMA DISPLAY PANEL USING THE SAME MINNESOTA MINING AND MANUFACTURING COMPANY (US) 2000-08-31 WO disclosed