SCHEMBL6437704

SCHEMBL6437704

OCCCC[C](O)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6434673 0.90
SCHEMBL11514221 0.83 GPR84 (0.50)
SCHEMBL4359372 0.74
SCHEMBL7048899 0.73 SMN1; SMN2 (0.58)
SCHEMBL7260181 0.73 GPR84 (0.52)
SCHEMBL19329177 0.73 SMN1; SMN2 (0.50)
1,4-Butanediol SCHEMBL7877094 0.73
1,4-Butanediol SCHEMBL321310 0.73 SMN1; SMN2 (0.54)
1,3-Propanediol SCHEMBL973980 0.73
Adipic Acid SCHEMBL29115691 0.71 GPR84 (0.88)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1172400-B1 THERMOPLASTIC RESIN FILM WITH SATISFACTORY PRINTABILITY YUPO CORP (JP) 2005-12-28 EP disclosed
US-6586106-B2 Ink transfer, adhesion and aging stability, and being satisfactory in back ghost when offset printing using oxidation polymerization type ink is performed on both faces YUPO CORPORATION (JP) 2003-07-01 US disclosed
US-20020054991-A1 Thermoplastic resin film satisfactory in printability YUPO CORPORATION (JP) 2002-05-09 US disclosed
EP-1172400-A1 THERMOPLASTIC RESIN FILM WITH SATISFACTORY PRINTABILITY Yupo Corporation (JP) 2002-01-16 EP disclosed
US-5686633-A PHOTOSTABILIZERS CIBA SPECIALTY CHEMICALS CORPORATION (US) 1997-11-11 US disclosed
EP-0373574-B1 Inks, especially for ink jet printing CIBA GEIGY AG (CH) 1994-09-14 EP disclosed
EP-0373573-B1 Recording material for ink jet printing CIBA GEIGY AG (CH) 1994-06-22 EP disclosed
US-5098477-A Aromatic ether derivatives as light stabilizers for organic materials CIBA-GEIGY CORPORATION (US) 1992-03-24 US disclosed
US-5096781-A Amine salts or quaternized compounds of 2,4-diphenyl-6-/2-/hydroxyphenyl/-s-triazine derivatives; color- and washfast inks for jet printing and recording CIBA-GEIGY CORPORATION (US) 1992-03-17 US disclosed
US-5073448-A Containing light stabilizers CIBA-GEIGY CORPORATION (US) 1991-12-17 US disclosed
CN-1043728-A Water-soluble cpds as photostabilizer CIBA GEIGY AG (CH) 1990-07-11 CN disclosed
EP-0374751-A2 Water-soluble light-projecting materials CIBA-GEIGY AG (CH) 1990-06-27 EP disclosed
EP-0373573-A1 Recording material for ink jet printing CIBA-GEIGY AG (CH) 1990-06-20 EP disclosed
EP-0373574-A1 Inks, especially for ink jet printing CIBA-GEIGY AG (CH) 1990-06-20 EP disclosed